Reticle Gripper Isolation Structure for Vibration Damping
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Solution Overview
Problem
Lithographic apparatuses face challenges in reducing vibrations within reticle handlers, which can lead to reticle slippage, particle generation, and imaging sensor blurring, affecting the precision and quality of pattern formation on substrates.
Innovation Solution
A reticle gripper damper and isolation system is introduced, comprising a static structure coupled to a reticle handler arm, an isolation structure, and damping elements such as eddy current dampers, which attenuate vibrations by using the mass of the reticle and reticle baseplate to create an isolated structure, providing passive isolation and damping.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional reticle handling systems are used without damping elements, then the device complexity is low, but vibrations cause reticle slippage, particle generation, and imaging sensor blurring
Solution Approach 1:
The damping elements are integrated within the gripper structure itself, with dampers nested between the gripper fingers and the reticle baseplate. This nested configuration provides vibration damping functionality without adding external components, thereby improving reticle positioning stability while minimizing increases in device complexity
Solution Approach 2:
Damping elements are introduced as intermediary components between the gripper mechanism and the reticle baseplate. These intermediaries absorb and dissipate vibrations, preventing them from reaching the reticle and causing slippage or particle generation, thus improving reliability without fundamentally changing the gripper's core structure
2Reliability
If active vibration compensation systems are used, then vibration reduction effectiveness is high, but the system requires additional power and cooling infrastructure
Solution Approach 1:
The damping elements are designed as passive components that automatically dissipate vibrations through their inherent mechanical properties (viscoelasticity, friction, or magnetic damping). The system serves itself by converting vibrational energy into heat or other forms of dissipated energy without requiring external power input, control systems, or cooling infrastructure, thus achieving vibration reduction effectiveness while maintaining zero additional power consumption
3Reliability
If passive isolation structures are added to reduce vibrations, then reticle handling stability improves, but the device volume increases
Solution Approach 1:
Instead of implementing a full-system passive isolation structure, damping elements are strategically placed only at critical locations where vibrations most affect reticle handling stability (e.g., between gripper fingers and baseplate, or at mounting points). This localized approach provides the necessary stability improvements while minimizing the additional volume required, as the damping functionality is concentrated in specific high-impact areas rather than distributed throughout the entire gripper
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces vibrations during reticle positioning and handling, preventing slippage and image blur, while being compact and requiring no additional cooling or power, thus enhancing the performance and throughput of lithographic apparatuses.
Implementation Method 1
one or more damping elements... such as eddy current dampers, which attenuate vibrations
Data Source
AI summary
Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.


