Reticle Assembly Handling with Localized Pads for Particle Reduction

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Solution Overview

Problem

Existing lithographic apparatuses face challenges in handling and assembling reticle assemblies, particularly in reducing particle contamination and ensuring precise alignment and attachment of pellicle assemblies and patterning devices, which can lead to defects in pattern projection onto substrates.

Innovation Solution

An object handling apparatus with support arms and aligners that minimize friction and contact area, a damper assembly to prevent damage, and a pellicle frame attachment apparatus with grippers and stud manipulators for precise handling and alignment, along with a measurement system using polarized light to enhance positioning accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional support mechanisms contact the entire outer perimeter of the pellicle assembly or patterning device, then the object is securely held, but particulate contaminants are produced due to increased friction and contact area

Engineering Contradiction:

Improvesecure holding of objectVSAvoidparticulate contamination

Core Design Contradiction:

ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The support mechanism is divided into multiple discrete support pads rather than a continuous contact surface. Each pad contacts only a localized region of the object, segmenting the total contact area to reduce friction-generated particulates while maintaining secure holding through distributed contact points

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The support pads are designed with specific local contact characteristics, contacting only predetermined regions of the object rather than the entire perimeter. This localized contact approach minimizes the area where friction can generate contaminants while still providing adequate support and holding force

Inventive Principle:

Principle #3Local quality

2Stability of the object's composition

If support arms make extensive contact with the object to ensure stable handling, then the object remains securely positioned, but friction increases producing more particulate debris

Engineering Contradiction:

Improvestable handling of objectVSAvoidparticulate debris

Core Design Contradiction:

Stability of the object's compositionVSObject-generated harmful factors

Solution Approach 1:

The contact interface is segmented into multiple discrete support pads distributed across the object surface. This segmentation provides stable handling through distributed contact points while minimizing the friction area at each individual pad, thereby reducing particulate debris generation

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Instead of contacting the entire object perimeter, the support pads make partial contact only at predetermined locations. This partial contact approach provides sufficient stability for secure handling while reducing the total friction area and associated particulate generation

Inventive Principle:

Principle #16Partial or excessive action

3Manufacturing precision

If the pellicle assembly and patterning device are precisely aligned and attached, then pattern projection quality is improved, but the assembly process becomes more complex and time-consuming

Engineering Contradiction:

Improvealignment precision of pellicle and patterning deviceVSAvoidassembly process complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The support pads are pre-positioned at predetermined locations on the support structure, and the alignment features are pre-configured on both the pellicle assembly and patterning device. This preliminary preparation enables precise alignment to be achieved more efficiently during the assembly process, reducing both complexity and time

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

Complex mechanical alignment mechanisms are replaced with simpler alignment features that utilize the predetermined support pad positions and pre-configured alignment marks. This substitution reduces assembly complexity while maintaining high precision through the structured, pre-planned alignment approach

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Reduces particle contamination, ensures precise alignment and attachment of pellicle assemblies and patterning devices, and enhances the accuracy of pattern projection onto substrates, thereby improving the quality and efficiency of lithographic processes.

Implementation Method 1

a measurement system using polarized light to enhance positioning accuracy

Methodology Applied

Scientific EffectPolarized light: Polarisation

Data Source

PatentUS12449726B2Apparatus for assembly of a reticle assembly

Publication Date: 2025.10.21 ASML NETHERLANDS BV

AI summary

An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.