Reticle Pod Recess Geometry to Weaken Electrostatic Particle Adsorption
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional reticle pods fail to effectively manage electrostatic charges on reticles, leading to pattern defects due to particle adsorption during the exposure process, as the residual voltage on reticles can attract particles from the base, causing contamination.
Innovation Solution
A reticle pod with a base featuring a recessed carrying surface and support members that create a gap between the reticle and the base, weakening the electrostatic force and preventing particle adsorption, with a recess depth ranging from 300 μm to 3400 μm to mitigate the effects of residual voltage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the reticle is placed close to the base for stable support, then the structural stability is improved, but the electrostatic force causes particles to be adsorbed to the reticle, worsening the contamination risk
Solution Approach 1:
The patent introduces a vertical dimension (depth) to the carrying surface by creating a recess, thereby increasing the distance between the reticle and base in the vertical direction while maintaining horizontal stability through support members
Solution Approach 2:
The patent changes the geometric parameter of the carrying surface by introducing a recess with specific depth (300-3400 μm), which modifies the electrostatic field distribution and reduces particle adsorption force
2Object-generated harmful factors
If the base is grounded to eliminate electrostatic charge, then the base charge is reduced, but the reticle still generates strong electrostatic field that attracts particles, worsening the particle adsorption problem
Solution Approach 1:
The patent applies preliminary anti-action by pre-configuring a recessed carrying surface that counteracts the electrostatic attraction before particle adsorption can occur, creating a geometric barrier that reduces the electrostatic field strength at the reticle-base interface
3Device complexity
If the reticle is supported directly on the base surface, then the device complexity is reduced, but the electrostatic force causes pattern defects, worsening the manufacturing precision
Solution Approach 1:
The patent segments the carrying surface into a recessed region and separates the support function (via support members) from the carrying function, thereby reducing particle adsorption while maintaining manufacturing precision
Solution Approach 2:
The patent modifies the carrying surface geometry by introducing a recess with controlled depth parameters, which reduces electrostatic particle adsorption and improves pattern defect rate without significantly increasing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces the electrostatic force acting on particles, minimizing the chance of contamination and pattern defects by ensuring a controlled gap that counteracts the electrostatic attraction, thus maintaining reticle cleanliness and pattern integrity.
Implementation Method 1
the recess is defined by a depth extending between the carrying surface and the bottom surface, the depth ranging from 300 μm to 3400 μm, so as to weaken electrostatic force exerted upon particles on the carrying surface
Data Source
AI summary
A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 μm to 3400 μm to thereby weaken the electrostatic force exerted upon particles on the carrying surface.