Reticle Pod Electrostatic Haze Removal
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Solution Overview
Problem
Haze particles formed from chemical residuals and impurities during reticle cleaning processes can contaminate the reticle assembly, leading to defects in semiconductor devices, as existing N2 purging methods are ineffective in removing trapped particles between the reticle and pellicle.
Innovation Solution
A reticle pod and stocker equipped with an electrostatic generator that alternates between positive and negative static electricity to repel charged particles trapped between the reticle and pellicle, preventing haze particle formation on the surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If N2 purging is used to remove chemical residuals and impurities from the reticle stocker, then some contaminants can be removed, but haze particles trapped between the reticle and pellicle cannot be removed
Solution Approach 1:
The patent replaces the mechanical N2 purging system with an electrostatic field-based particle removal system. The electrostatic generator creates alternating positive and negative charges that actively repel charged particles away from the reticle and pellicle surfaces, providing a more effective mechanism for removing trapped haze particles compared to passive gas purging
Solution Approach 2:
The patent changes the physical parameter of particle removal from chemical/gas-based (N2 purging) to electrostatic-based. By applying alternating electrostatic charges to the reticle assembly, the system dynamically controls particle behavior, forcing charged particles away from critical surfaces through electrostatic repulsion forces
2Manufacturing precision
If chemical cleaning processes are used to remove impurities from the reticle, then cleaning effectiveness improves, but chemical residuals form precipitants that create haze particles
Solution Approach 1:
The patent applies electrostatic field treatment after chemical cleaning to prevent haze particle formation. By generating alternating electrostatic charges on the reticle assembly, the system proactively repels charged particles away from the reticle and pellicle surfaces before they can settle and form permanent contamination
Solution Approach 2:
The patent converts the harmful charged particles (which would normally settle and form haze) into a controllable element by using electrostatic repulsion. The same charged particles that cause contamination are now actively managed through electrostatic fields, forcing them away from critical surfaces and preventing haze formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively reduces wafer defects caused by haze contamination by keeping charged particles away from the reticle and pellicle surfaces, enhancing the cleanliness and quality of semiconductor manufacturing processes.
Implementation Method 1
The electrostatic generator is coupled to the reticle assembly and configured to generate static electricity to the reticle assembly. The static electricity alternates between positive electricity and negative electricity.
Data Source
AI summary
A stocker for holding a plurality of reticle pods is provided. Each of the reticle pods is configured to accommodate a reticle assembly. The reticle assembly includes a reticle and a pellicle covering the reticle. The stocker includes a main frame and an electrostatic generator. The main frame has an inner space and at least one pod support disposed in the inner space. The pod support divides the inner space into a plurality of chambers configured to respectively accommodate the plurality of reticle pods. The electrostatic generator is coupled to the reticle assembly and configured to generate static electricity to the reticle assembly. The static electricity alternates between positive electricity and negative electricity.