Reticle Pod Sealing and Filtration for Particle Control
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Solution Overview
Problem
Current lithography operations in semiconductor fabrication face challenges in maintaining the cleanliness and integrity of reticles, leading to particle generation and contamination, which degrades the resolution of circuit patterns and reduces product yield.
Innovation Solution
A reticle pod system with a fluid regulating module and filter configuration that blocks incoming gas flow and allows controlled exhaust, using a sealing film to prevent particle contamination and maintain a clean environment for the reticle during transportation and lithography processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the reticle is exposed to ambient environment during transportation and handling, then ease of operation is improved, but particle contamination increases leading to degraded manufacturing precision
Solution Approach 1:
The reticle is nested within a reticle pod that contains a controlled environment. The pod includes an inner chamber that houses the reticle and maintains a particle-free atmosphere, while the outer structure provides mechanical protection and interfaces with handling equipment. This nested configuration allows the reticle to be easily transported and handled while maintaining manufacturing precision.
Solution Approach 2:
The reticle pod creates an inert or controlled atmosphere environment around the reticle during transportation and handling. This controlled environment prevents particle contamination by maintaining positive pressure and filtering incoming air, thereby preserving manufacturing precision while enabling ease of operation through standardized pod handling procedures.
2Manufacturing precision
If a sealed reticle pod is used to prevent particle contamination, then manufacturing precision is improved, but device complexity increases due to additional sealing and pressure control mechanisms
Solution Approach 1:
The reticle pod system is segmented into distinct functional modules: a sealed chamber for particle protection, a pressure control system with regulators and sensors, a filtration system, and a handling interface. This segmentation allows each subsystem to be optimized independently and facilitates maintenance while achieving the overall goal of maintaining manufacturing precision through controlled environment.
Solution Approach 2:
The reticle pod acts as an intermediary between the ambient environment and the reticle. It provides a controlled transition zone with pressure regulation and filtration, mediating the interaction between the external handling system and the sensitive reticle, thereby maintaining manufacturing precision without requiring direct exposure control.
3Ease of operation
If gas flow is allowed into the reticle pod interior, then ease of operation for pressure equalization is improved, but particle contamination from incoming gas flow increases manufacturing precision degradation
Solution Approach 1:
A filtration system serves as an intermediary between the ambient gas flow and the reticle pod interior. The filter captures particles from incoming gas while allowing pressure equalization, enabling ease of operation during opening/closing cycles without compromising manufacturing precision by blocking particle-laden gas from entering the controlled environment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively minimizes particle generation on the reticle, ensuring high-resolution circuit patterns and improving the yield of semiconductor wafers by maintaining a clean and controlled environment for the reticle during lithography operations.
Implementation Method 1
a filter positioned adjacent to the first cap and placed in between the fluid regulating module and the vent-hole cap
Implementation Method 2
blocking an inlet flow of gas from entering an interior of the reticle pod with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film
Data Source
AI summary
A method is provided. The method includes detaching an upper shell of a reticle pod from a base. The method further includes while the upper shell is detached from the base, blocking an inlet flow of gas from entering an interior of the reticle pod between the upper shell and the base with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film. The method also includes removing a reticle positioned on the base to a process tool. In addition, the method includes performing a lithography operation in the process tool with the use of the reticle.