Reticle Pod Reflectivity Marks for Precise Platform Alignment
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Solution Overview
Problem
Existing reticle pods lack effective optically identifiable marks for precise placement and identification on processing platforms, particularly in semiconductor processing apparatus, which can lead to alignment and displacement issues during lithography processes.
Innovation Solution
A reticle pod design featuring a base with distinct optically identifiable marks, including a first mark and a second mark with different reflectivities, allowing for accurate placement and identification using laser detection, where the marks are strategically positioned on the bottom surface and formed through laser engraving or surface processing to ensure unique reflectivity values.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional reticle pods without distinct optically identifiable marks are used, then the device structure is simpler, but the alignment precision and identification accuracy on processing platforms deteriorate
Solution Approach 1:
The identification system is segmented into multiple distinct marks (first mark and second mark) with different reflectivities, allowing the platform to differentiate between orientation and identification information through separate optical signals
Solution Approach 2:
Different regions of the reticle pod bottom surface are given different optical properties - the first mark has a first reflectivity and the second mark has a second reflectivity, creating locally differentiated qualities that enable precise identification and orientation detection
2Measurement precision
If reticle pods lack distinct optically identifiable marks, then the manufacturing process is simpler, but the identification accuracy and placement correctness deteriorate
Solution Approach 1:
The mechanical identification method is replaced with an optical detection system using laser beams and reflectivity-based marks, allowing non-contact identification and orientation detection through optical properties rather than mechanical features
3Manufacturing precision
If multiple marks with different reflectivities are added to the reticle pod, then the placement accuracy and identification capability improve, but the device complexity increases
Solution Approach 1:
The reticle pod bottom surface features asymmetric mark configuration - a first mark (circular) positioned at the center and a second mark (square) positioned at an offset location, creating an asymmetric optical signature that enables the platform to determine both orientation and identification uniquely
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables precise alignment and identification of the reticle pod on processing platforms, enhancing the accuracy of semiconductor processing by generating distinct voltage values from reflected light, indicating correct placement and reticle pod information, thereby improving manufacturing process efficiency.
Implementation Method 1
the first mark has a first reflectivity relative to a light source, the second mark has a second reflectivity relative to the light source
Data Source
AI summary
The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface having at least one first mark and at least one second mark. The first mark has a first reflectivity relative to a light source, and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity, and both are also different from that of the rest area of the bottom surface.