Reticle Pod Spherical Support and Diffusion Filter
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Solution Overview
Problem
Current reticle containers fail to provide adequate protection against particle contamination and shock-induced misalignment during storage, transport, and shipping of reticles used in EUV photolithography, due to inadequate support structures and environmental control systems, leading to potential damage and quality issues in semiconductor fabrication.
Innovation Solution
A reticle pod with spherical ball positioning and support systems that minimize contact with the reticle, combined with a diffusion filter for pressure equalization and a seal that eliminates traditional elastomeric materials, ensuring stable support and a controlled environment to prevent particle migration and maintain reticle quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional support structures and sealing methods are used in reticle containers, then the container can be manufactured with conventional materials and processes, but the reticle is susceptible to particle contamination and shock-induced misalignment during storage and transport
Solution Approach 1:
The patent employs spherical support elements instead of traditional flat or angular support structures. These spherical elements contact the reticle at discrete points, minimizing contact area and reducing particle generation while providing stable support during storage and transport. The curved geometry of spherical elements also allows for easier cleaning and maintenance compared to complex angular structures.
Solution Approach 2:
The patent utilizes thin film sealing mechanisms rather than traditional thick elastomeric seals. These thin films provide effective particle barriers while being more compliant and less prone to degradation. The thin film approach reduces the overall complexity of the sealing system while maintaining or improving protection against particle contamination.
2Object-generated harmful factors
If minimal contact support structures are used for the reticle, then particle generation from contact is reduced, but the reticle may become unstable or misaligned during handling
Solution Approach 1:
Spherical support elements provide point contact with the reticle, minimizing the contact area and thus reducing particle generation from friction and wear. The spherical geometry naturally accommodates minor positioning variations while maintaining stable support, preventing both excessive contact and reticle instability.
Solution Approach 2:
The patent introduces spherical elements as intermediary components between the container and the reticle. These spherical mediators provide the necessary mechanical support while isolating the reticle from direct contact with potentially particle-generating surfaces, thus reducing particle generation while maintaining stability.
3Ease of operation
If elastomeric sealing materials are used in the container, then the seal can accommodate manufacturing tolerances and assembly variations, but the elastomeric material itself becomes a source of particle contamination
Solution Approach 1:
The patent replaces traditional thick elastomeric seals with thin film sealing structures. These thin films maintain the necessary flexibility to accommodate manufacturing tolerances and assembly variations while presenting a much smaller surface area that is less prone to particle generation and contamination.
Solution Approach 2:
The patent extracts or removes the problematic elastomeric material from the sealing system. By eliminating elastomeric components that generate particles, the design achieves sealing functionality through alternative means (such as metal-to-metal contacts or thin film barriers) that do not contribute to particle contamination.
4Object-affected harmful factors
If the container provides a hermetically sealed environment for the reticle, then particle contamination from the external environment is prevented, but pressure equalization becomes difficult without creating turbulence that could migrate particles
Solution Approach 1:
The patent introduces a diffusion filter as an intermediary component between the sealed container interior and the external environment. This filter allows slow pressure equalization through diffusion mechanisms while maintaining the hermetic seal, preventing both rapid pressure changes and particle migration that would occur with traditional equalization methods.
Solution Approach 2:
The diffusion filter creates a controlled transition zone that maintains an inert or controlled atmosphere within the container. By allowing only slow molecular diffusion rather than rapid bulk flow, the system maintains environmental control while enabling pressure equalization without turbulence-induced particle migration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively secures reticles against movement and contamination, maintaining a clean environment and preventing particle migration, thus ensuring the quality of semiconductor products by minimizing contact and using a diffusion filter for pressure equalization without generating particles.
Implementation Method 1
A diffusion filter providing slow pressure equalization between an interior and an exterior of the EUV pod
Data Source
AI summary
A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.