Stackable Reticle Pods With Purge-Gas Alignment for Clean Storage
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional EUV reticle storage systems using double pods are bulky, require significant space, and are prone to abrasion and outgassing, leading to contamination and inefficiencies in photolithographic processes.
Innovation Solution
A compact stocker system utilizing single storage pods with integrated purge gas passageways and alignment features that allow direct stacking, ensuring a reliable and efficient purge gas flow to minimize contamination and reduce space requirements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If double pod containers (EOP and EIP) are used for EUV reticle storage and transport, then reticle protection against contamination and abrasion is improved, but space requirements and system footprint increase significantly
Solution Approach 1:
The patent applies nesting by placing the inner pod (EIP) containing the reticle inside the outer pod (EOP), creating a compact hierarchical structure. This nested arrangement protects the reticle while minimizing the overall volume occupied in the stocker, directly resolving the contradiction between protection and space efficiency.
Solution Approach 2:
The patent merges the protection functions of the outer pod and inner pod into a unified double-pod system, where both containers work together to provide comprehensive reticle protection. This combined approach maintains high reliability while the integrated design optimizes space utilization compared to separate storage solutions.
2Ease of manufacture
If polymeric materials are used for outer pod construction, then ease of manufacture and sealing are improved, but abrasion and outgassing of volatile organic compounds increase leading to contamination
Solution Approach 1:
The patent introduces an intermediary barrier layer between the polymeric outer pod and the reticle environment. This intermediate layer prevents direct contact, blocking the transmission of harmful outgassed compounds and abrasion particles from the polymeric material to the sensitive reticle, thus resolving the contradiction between manufacturing ease and contamination prevention.
Solution Approach 2:
The patent extracts the harmful outgassing and abrasion properties from the system by using a barrier layer that isolates the polymeric outer pod materials from the reticle environment. This extraction of harmful factors allows the use of easily manufacturable polymeric materials without compromising reticle cleanliness.
3Stability of the object's composition
If alignment features are added to storage pods for stacking, then stacking stability and space efficiency are improved, but complexity of pod design and manufacturing increases
Solution Approach 1:
The patent applies multi-functionality by designing alignment features that serve dual purposes: providing precise mechanical alignment between stacked pods and enabling stable stacking configurations. These same features also facilitate automated handling and positioning, reducing overall system complexity despite the added pod design elements.
Solution Approach 2:
The patent segments the alignment function into discrete, modular features integrated into the pod structure. This segmentation allows the alignment features to be independently manufactured and assembled, reducing overall manufacturing complexity while achieving the required stacking stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system provides a compact and reliable storage solution with reduced space requirements, effective purge gas flow, and minimized cross-contamination, enhancing the efficiency and reliability of EUV reticle handling.
Implementation Method 1
designed the alignment features of the stocker pods with the additional functionality of providing a flow of purge gas therethrough
Data Source
Figure 1
Figure 2
Figure 3~4
AI summary
Stocker system for storage of a plurality of reticles, especially EUV reticles, comprising a plurality of storage pods (110), each storage pod (110) comprising a base plate (112) and a cover (114) defining an interior space (111) and each configured and adapted to hold one of said reticles in the interior space (111), the storage pods (110) further being adapted to be stacked vertically one above the other to provide a stacked configuration (80), each storage pod being provided with alignment features (130,132) in its base plate and its cover, the alignment features being configured and adapted to enable mechanical alignment of a storage pod with adjacent storage pods in the stacked configuration (80), wherein at least some of the alignment features (130,132) are configured and adapted to allow a flow of purge gas therethrough.