Reticle Storage Purge System for Haze Control
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Solution Overview
Problem
Semiconductor manufacturing facilities face challenges with particulate and airborne molecular contaminants (AMC) causing reticle defects, such as hazing, despite the use of reticle pods for protection, as contaminants accumulate and traditional nitrogen purging is inefficient and poses safety concerns.
Innovation Solution
A reticle handling system that maintains a low humidity environment using extra dry clean air or adsorbent media, with a filter media that can be recharged during purging, to reduce haze formation by minimizing water presence and contaminants on reticles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If periodic cleanings are performed to minimize contaminants in reticle pod, then contaminant levels are reduced, but manufacturing efficiency decreases
Solution Approach 1:
The system implements continuous purging operation where filtered air constantly flows through the reticle containment environment, maintaining low contaminant levels without interruption to manufacturing operations. This eliminates the need for periodic shutdowns for cleaning.
Solution Approach 2:
The system pre-filters ambient air through HEPA and AMC filters before introducing it to the reticle containment, proactively preventing contaminant accumulation rather than reacting to contamination levels with periodic cleanings.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces haze formation on reticles by maintaining a controlled environment with low humidity, minimizing the risk of water introduction and contaminant accumulation, thereby protecting reticles during storage and transportation.
Implementation Method 1
By substantially continually maintaining either a purge of preferably extra dry clean air having a reduced humidity level on reticles
Implementation Method 2
or by temporarily storing the reticle in a container in proximity to an adsorbent or dessicant media when not being purged
Implementation Method 3
or by temporarily storing the reticle in a container in proximity to an adsorbent or dessicant media
Implementation Method 4
Moreover, a filter media in the container may be positioned to be 'recharged' during the substantially continual purging of the reticle
Data Source
Figure 1a
Figure 1b~2
Figure 3~5b
AI summary
The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be "recharged" during the substantially continual purging of the reticle, a reduced desireable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.