Reticle Thermal Conditioning for Overlay-Stable Lithography
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Solution Overview
Problem
Existing reticle cooling systems in DUV lithography are costly and complex, leading to non-uniform thermal profiles and image distortion due to reticle heating, which affects overlay accuracy in lithographic apparatuses.
Innovation Solution
A low-cost, low-complexity thermal conditioning system for reticles using a thermal conditioner and controller to manage temperature and production states, employing air and fluid circulation for precise temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If customized nozzles and gas outlets are implemented for reticle cooling, then reticle temperature control is improved, but system cost and complexity increase
Solution Approach 1:
The patent applies universality by using a single gas outlet structure that serves multiple functions: it provides cooling gas flow to the reticle surface and simultaneously maintains a controlled atmosphere. The gas outlet is integrated into the reticle holder assembly, eliminating the need for separate customized nozzles and cooling systems, thereby reducing system complexity while maintaining effective temperature control
2Temperature
If customized nozzles and gas outlets are implemented for reticle cooling, then reticle temperature control is improved, but system cost increases
Solution Approach 1:
The patent merges the cooling function with the existing reticle holder structure by integrating the gas outlet directly into the holder assembly. This consolidation eliminates the need for separate customized nozzles and independent cooling systems, reducing the total number of components and lowering manufacturing costs while maintaining effective reticle temperature control
3Manufacturing precision
If reticle cooling methods are utilized, then image distortion and overlay errors are reduced, but system complexity increases
Solution Approach 1:
The patent applies self-service by enabling the reticle holder assembly to perform its own thermal management function through the integrated gas outlet. The structure provides cooling capability inherently through its design, eliminating the need for separate complex cooling systems while maintaining overlay accuracy by preventing reticle heating and deformation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively maintains reticle temperature stability, reducing thermal deformations and overlay errors, enhancing lithographic apparatus performance without increasing system complexity or cost.
Implementation Method 1
thermal conditioner configured to thermally condition the patterning device... employing air and fluid circulation for precise temperature control
Data Source
AI summary
Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a litho-graphic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the litho-graphic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.