Reversing Unit Grip Mechanism for Photomask Handling
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Solution Overview
Problem
The existing substrate handling and cleaning processes face challenges such as contamination and damage due to direct surface contact and improper gripping, which can lead to defects in the photomask patterns during the exposure process.
Innovation Solution
An apparatus with a reversing unit that includes a grip unit with inclined surfaces to support and guide the substrate, minimizing contact points and preventing contamination, and a drive unit that rotates to reverse the substrate, along with a buffer unit for temporary storage, all designed to handle substrates with precision and prevent damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the grip part makes surface-to-surface contact with the photomask to grip it, then the photomask can be securely held and reversed, but the photomask may be contaminated by contaminants on the grip part or damaged by scratches when not maintained in a horizontal state
Solution Approach 1:
The grip part is divided into multiple grip portions that contact different regions of the photomask simultaneously. This segmentation distributes the gripping force across multiple points, preventing concentrated stress that could cause scratches while maintaining secure holding. The multiple contact points also reduce the risk of contamination spreading across the entire surface.
Solution Approach 2:
The grip portions extend in the vertical direction (thickness direction of the photomask) to contact the photomask at multiple height levels. This dimensional approach allows the grip part to securely hold the photomask through distributed contact while minimizing the horizontal footprint of each contact point, thereby reducing contamination and damage risks.
2Ease of operation
If the photomask is gripped by making surface-to-surface contact, then the reversing operation can be performed, but particles may be generated due to damage such as scratches when the photomask or grip part is not maintained in a horizontal state
Solution Approach 1:
The grip portions are designed with predetermined contact positions and orientations that ensure the photomask is held in a proper horizontal state before the reversing operation begins. This preliminary positioning prevents the photomask from tilting or shifting during gripping, thereby avoiding scratches and particle generation while enabling smooth reversing operation.
3Manufacturing precision
If the photomask cleaning apparatus is used to remove foreign matter, then the photomask can be cleaned effectively, but the photomask may be contaminated again by contaminants on the grip part during the handling process
Solution Approach 1:
The grip portions act as intermediary elements between the grip part and the photomask surface. By designing these intermediaries with controlled contact areas and materials, the system enables effective handling and reversing operations while minimizing direct contamination transfer to the photomask surface, thus preventing re-contamination after cleaning.
Data Source
AI summary
The inventive concept provides an apparatus for supporting a substrate. An apparatus for treating a substrate includes a process chamber that performs a predetermined process on the substrate and a reversing unit that reverses the substrate. The reverse unit includes a grip unit that grips the substrate and a drive unit that rotates the grip unit to reverse the substrate gripped by the grip unit. The grip unit includes a first body that supports one of an upper surface and a lower surface of the substrate and a second body that supports the other surface of the substrate. Each of the first body and the second body includes a support protrusion that is brought into contact with the substrate when the grip unit grips the substrate.