Direct RF Power Coupling in LINAC Systems
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Solution Overview
Problem
High-power RF LINAC systems face challenges in efficiently coupling RF power due to the need for additional hardware, increased cost, and complexity, particularly when attempting to operate at high powers within a vacuum environment, where multipactoring and cooling issues arise.
Innovation Solution
A system that injects RF power directly into an RF LINAC cavity by placing the RF power amplifier and associated circuitry outside the vacuum environment, using a hermetic HV break and active cooling to mitigate multipactoring and allow for easy maintenance, while utilizing a magnetic array and sputtering electrode to generate high-power pulsed plasma for nanolayered coatings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If RF power is coupled into high-power RF cavity via waveguide and hermetic RF window, then high power transmission is achieved, but system size, cost and complexity increase
Solution Approach 1:
The patent extracts the RF amplifier assembly from the vacuum environment and places it outside the vacuum chamber. This eliminates the need for hermetic RF windows and complex waveguide couplings, directly reducing system complexity while maintaining high power transmission capability through direct atmospheric coupling to the cavity.
2Device complexity
If vacuum tube is included within vacuum envelope for direct RF coupling, then system complexity is reduced, but high power operation becomes impossible due to multipactoring
Solution Approach 1:
The patent segments the system into two distinct environments: the RF amplifier assembly operates in atmospheric pressure outside the vacuum chamber, while the RF cavity operates in vacuum. This segmentation allows each component to operate in its optimal environment, enabling high power operation without multipactoring while maintaining reduced system complexity.
3Device complexity
If RF amplifier is mounted on RF cavity with direct coupling, then system complexity is reduced, but cooling becomes difficult due to high power dissipation
Solution Approach 1:
The patent introduces a hermetic feedthrough as an intermediary element that enables direct coupling between the atmospheric RF amplifier and the vacuum RF cavity while providing a thermal management interface. This allows efficient heat dissipation from the amplifier through the feedthrough structure, solving the cooling difficulty while maintaining the simplified direct coupling architecture.
4Power
If high voltage is applied to vacuum tube anode for RF amplification, then RF power amplification is achieved, but coolant selection becomes restricted due to high voltage constraints
Solution Approach 1:
The patent segments the high voltage RF amplification function from the cooling function by placing the vacuum tube anode in the atmospheric environment outside the vacuum chamber. This allows the use of standard cooling methods and a wide range of coolant options without high voltage constraints, while still achieving RF power amplification through the vacuum tube operated at high voltage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the complexity and cost of RF LINAC systems, enables high-power operation without multipactoring, and allows for efficient cooling and maintenance, achieving higher accelerating gradients with lower RF power requirements.
Implementation Method 1
a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target
Implementation Method 2
generating a configurable sustained positive voltage kick pulse to the magnetron target electrode after terminating the negative DC pulse
Implementation Method 3
generating and controlling ion flux for direct current high-power impulse magnetron sputtering
Implementation Method 4
magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target
Data Source
AI summary
A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.