Standalone RF Matching Network for Flexible Atmospheric Plasma Tuning
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Solution Overview
Problem
Existing impedance matching systems for atmospheric pressure plasma creation are limited by the need for predetermined cable lengths and fixed geometries, which restrict placement flexibility and do not account for varying environmental conditions, leading to inefficient power transfer and potential harm from harmful particles.
Innovation Solution
A standalone impedance matching network that adjusts in real-time to minimize impedance differences by independently controlling the magnitude and phase of RF power, allowing flexible placement relative to the plasma source and enabling stable plasma production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If impedance matching circuitry is placed in a fixed position inside the power controller with predetermined cable lengths, then impedance matching can be achieved, but placement flexibility is limited and system configuration is restricted
Solution Approach 1:
The patent applies dynamics by making the impedance matching network adjustable and reconfigurable rather than fixed. The matching network can be dynamically tuned to accommodate different cable lengths, positions, and environmental conditions, allowing the system to adapt to various configurations while maintaining reliable impedance matching.
Solution Approach 2:
The patent changes physical parameters by allowing the impedance matching network to adjust its electrical parameters (capacitance, inductance) based on environmental conditions, cable length, and position. This enables the system to compensate for variations in installation geometry and maintain optimal impedance matching across different configurations.
2Ease of manufacture
If tuning coefficients are precalculated and stored in the controller configuration file, then impedance matching works for standard configurations, but separate coefficients are needed for different plasma sources and geometries
Solution Approach 1:
The patent achieves universality by designing an impedance matching network that can serve multiple plasma source types and geometries through dynamic adjustment. Rather than requiring separate precalculated coefficients for each plasma source, the system can adapt to different configurations by tuning its parameters, making it universally applicable across various plasma generation scenarios.
Solution Approach 2:
The patent applies preliminary action by providing default or average tuning coefficients that work for standard configurations, while also enabling real-time adjustment. This allows the system to start with precalculated values for ease of implementation, then adapt to specific plasma sources and geometries through automated tuning algorithms.
3Adaptability or versatility
If the impedance matching network is standalone and remotely located, then placement flexibility is improved, but cable length and position variations affect impedance
Solution Approach 1:
The patent applies feedback by implementing automated tuning algorithms that continuously monitor impedance conditions and adjust the matching network parameters accordingly. This feedback mechanism compensates for variations caused by different cable lengths and positions, maintaining stable impedance matching even when the network is remotely located or repositioned.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures reliable and efficient plasma species production by dynamically matching impedance, minimizing power reflection, and allowing for arbitrary system configurations, thus enhancing operational flexibility and safety.
Implementation Method 1
a matching network to tune the impedance of the RF power source
Implementation Method 2
The matching network can include a first capacitor and a second capacitor, each capacitor having a terminal coupled to a node
Implementation Method 3
converting the RF power into a DC voltage indicator signal that can be used to tune the matching network
Implementation Method 4
Atmospheric pressure plasmas have been developed to treat an object of any size and shape
Implementation Method 5
plasma creation at atmospheric pressure
Data Source
AI summary
A system comprises a standalone matching network configured to be coupled to a power controller and an atmospheric pressure plasma creation device by way of coaxial cables of arbitrary length. The matching network comprises circuitry to receive electrical power by way of the first coaxial cable, receive a control signal including instructions to tune the impedance by adjusting a magnitude and phase of the electrical power in a way that minimizes impedance in the system; and output the electrical power by way of the second coaxial cable.