High-Frequency Power Supply Matching via Three-Point Reflection Fitting

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Solution Overview

Problem

Existing plasma processing apparatuses face challenges in quickly determining the matching frequency of high-frequency power for producing plasma, which affects the efficiency and effectiveness of the plasma generation process.

Innovation Solution

A high-frequency power supply system that includes a power generator, an output part, a sensor, and a controller. The controller uses three different frequencies to obtain reflection coefficients and determines the matching frequency as the frequency of the minimum point of a quadratic function expressing the relationship between these frequencies and the reflection coefficients, thereby controlling the power generator to output high-frequency power at this matching frequency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If frequency sweeping is performed to determine matching frequency, then the matching frequency can be determined, but the process takes a long time and reduces productivity

Engineering Contradiction:
Improvematching frequency determinationVSAvoidplasma generation efficiency
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent changes the measurement approach from continuous frequency sweeping to discrete frequency point sampling. By measuring reflection coefficients at only three specific frequency points (f1, f2, f3) and using quadratic function interpolation, the system determines the matching frequency without performing a full frequency sweep, thus significantly reducing measurement time while maintaining determination accuracy

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a mathematical model (quadratic function) that copies or represents the reflection coefficient-frequency relationship. Instead of measuring across the entire frequency range, the system uses three sampled points to construct a quadratic function that models the reflection characteristics, allowing the matching frequency to be derived from the model's minimum point rather than exhaustive measurement

Inventive Principle:
Principle #26Copying

2Productivity

If three frequency points are measured and quadratic function fitting is performed, then the matching frequency can be determined quickly, but additional calculation complexity is introduced

Engineering Contradiction:
Improvematching frequency determination speedVSAvoidcontrol system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent replaces the mechanical/physical process of frequency sweeping with a mathematical calculation process. Instead of physically tuning through frequencies and measuring continuously, the system uses three discrete measurements combined with quadratic function fitting and derivative calculation to compute the matching frequency, substituting computational complexity for physical measurement complexity

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system uses the measured reflection coefficient data itself to generate the solution. The three measured points (f1, Γ1), (f2, Γ2), (f3, Γ3) directly provide the information needed to construct the quadratic function and find its minimum, allowing the measurement data to serve both as input and as the basis for the solution without requiring external calibration or additional reference measurements

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution allows for rapid determination of the matching frequency, reducing reflection of high-frequency power and enhancing the efficiency of plasma generation in plasma processing apparatuses.

Implementation Method 1

a sensor configured to specify a reflection coefficient of the high-frequency power for a load connected to the output part

Methodology Applied
Scientific EffectReflection: Reflection

Data Source

PatentUS20250095954A1High-Frequency Power Supply, Plasma Processing Device, and Matching Method
Publication Date: 2025.03.20 TOKYO ELECTRON LTD
  • US20250095954A1 patent drawing
  • US20250095954A1 patent drawing
  • US20250095954A1 patent drawing

AI summary

Provided is a high-frequency power supply comprising: a power generator configured to generate a high-frequency power having a variable frequency; an output part configured to output the high-frequency power; a sensor configured to specify a reflection coefficient of the high-frequency power for a load connected to the output part; and a controller configured to determine a matching frequency of the high-frequency power for the load, wherein the controller is configured to: (i) obtain three reflection coefficients corresponding to a first frequency, a second frequency, and a third frequency from the sensor; (ii) determine, as the matching frequency, a frequency of a minimum point of a quadratic function that expresses the relationship between the first to third frequencies and the three reflection coefficients; and (iii) control the power generator to generate the high-frequency power having the matching frequency.