Rigidly Connected EUV Mirrors for Stiffness

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Solution Overview

Problem

High-aperture microlithographic projection exposure apparatuses face challenges in maintaining optical element stability and reducing parasitic moments or forces, particularly due to the thinness of mirrors used in the EUV range, which affects imaging properties and stiffness.

Innovation Solution

The optical arrangement involves a rigid connection between two mirrors, either monolithic or connected via a glass ceramic ring, to increase stiffness and natural frequency, reducing the impact of parasitic forces and maintaining imaging quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If mirrors are made thinner to reduce mass and allow smaller spacing between mirror and wafer, then the numerical aperture can be increased, but the stiffness and natural frequency of the mirror decrease, leading to increased sensitivity to parasitic forces and vibrations

Engineering Contradiction:
Improvenumerical apertureVSAvoidmirror stiffness
Core Design Contradiction:
SpeedVSStrength

Solution Approach 1:

The patent merges two mirrors (first mirror and second mirror) into a single rigidly connected unit. This combination increases the overall stiffness and mass of the optical element, thereby raising the natural frequency and reducing sensitivity to vibrations while maintaining the required small spacing to the wafer for high numerical aperture operation

Inventive Principle:
Principle #5Merging (Combining)

2Length of stationary object

If mirrors are made thinner to reduce mass, then the spacing between mirror and wafer can be reduced, but the mirror becomes more susceptible to parasitic moments and forces from external vibrations

Engineering Contradiction:
Improvespacing between mirror and waferVSAvoidoptical element stability
Core Design Contradiction:
Length of stationary objectVSReliability

Solution Approach 1:

By rigidly connecting two mirrors into one unit, the patent increases the moment of inertia and structural stability of the optical element. This allows the use of thinner mirrors with smaller spacing to the wafer while maintaining adequate resistance to parasitic moments and external vibrations through the combined structure's higher natural frequency

Inventive Principle:
Principle #5Merging (Combining)

3Adaptability or versatility

If all mirrors are coupled to a carrier structure by actuators without rigid solid-body connection, then each mirror can be independently actuated, but the overall system complexity increases and the mirrors lack sufficient stiffness

Engineering Contradiction:
Improveactuation freedomVSAvoidconnection structure complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent combines two mirrors into a rigidly connected unit, reducing the number of separate actuation systems needed. This merger simplifies the overall connection structure while maintaining adequate actuation capability through the 6 remaining degrees of freedom of the combined unit, and significantly increases stiffness compared to individually mounted thin mirrors

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS9086561B2Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
Publication Date: 2015.07.21 CARL ZEISS SMT GMBH
  • US9086561B2 patent drawing
  • US9086561B2 patent drawing
  • US9086561B2 patent drawing

AI summary

The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.