Alignment-Pin Ring Pod for Stable Focusing Ring Placement
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Solution Overview
Problem
In semiconductor device manufacturing, the precise alignment and placement of focusing rings in substrate treating apparatuses are challenging due to human error and mechanical transfer processes, leading to inconsistent etching characteristics and the need for frequent replacement, which complicates the process of maintaining uniform plasma distribution.
Innovation Solution
A container with a support part featuring alignment pins and slots, along with a transfer robot controlled by a controller, ensures precise alignment and minimizes location changes of expendable components during transfer, maintaining proper placement in the process chamber and reducing impurity transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If an operator manually carries the focusing ring into the ring pod, then the operator can place the focusing ring, but the location of the focusing ring becomes uncertain due to operator skill variation
Solution Approach 1:
The patent replaces manual mechanical placement with an automated transfer robot that uses suction cups to grasp and transfer the focusing ring. This substitution eliminates operator skill variation and ensures consistent, precise placement of the focusing ring in the ring pod, resolving the contradiction between ease of operation and manufacturing precision.
2Productivity
If the overhead transport apparatus transfers the ring pod, then the focusing ring can be delivered to the process chamber, but the location of the focusing ring may change during transport
Solution Approach 1:
The patent implements preliminary alignment actions by designing the ring pod with specific structural features (alignment pins, guide slots) that pre-position the focusing ring before transport. This preliminary positioning ensures the focusing ring maintains its location during overhead transport, resolving the contradiction between transfer efficiency and location stability.
3Productivity
If the focusing ring is etched repeatedly with plasma, then the substrate can be processed, but the shape of the focusing ring gradually changes and etching characteristics become inconsistent
Solution Approach 1:
The patent treats the focusing ring as a consumable component with limited service life. After a predetermined number of substrate etchings or when the focusing ring shape changes beyond allowable ranges, the entire ring pod containing the focusing ring is automatically replaced. This approach maintains etching uniformity by ensuring the focusing ring is always within specification, resolving the contradiction between productivity and etching precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures accurate alignment and placement of components, stabilizes etching characteristics, and minimizes impurity transfer, enhancing the efficiency and reliability of substrate treatment processes.
Implementation Method 1
a hand of the transfer robot is suction-held to the focusing ring
Data Source
AI summary
Disclosed is a container. The container includes a housing having an interior space, and a support part that supports an expendable component in the interior space, and the support part includes an alignment pin that aligns the expendable component.