Ring Segment Electron Accelerator for Non-Symmetrical Substrates
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Solution Overview
Problem
Existing devices for generating accelerated electrons struggle to uniformly treat substrates with non-rotationally symmetrical cross-sections due to geometric limitations and high equipment costs, and are inefficient for larger molded parts and fluids.
Innovation Solution
A ring-shaped device with a partially open design, featuring a ring segment shape with a ring angle of at least 45°, allowing for uniform electron distribution and accommodating substrates with varying cross-sections by adjusting the plasma chamber sub-segments and electron exit window configuration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a closed ring-shaped device is used to treat substrates, then uniform electron distribution is achieved, but substrates with non-rotationally symmetrical cross-sections cannot be uniformly treated and larger molded parts cannot be accommodated
Solution Approach 1:
The closed ring-shaped device is segmented by introducing an opening, transforming it into a ring segment configuration. This segmentation allows the device to accommodate substrates with varying cross-sections and non-rotationally symmetrical shapes while maintaining uniform electron treatment through the ring segment geometry that can adapt to different substrate configurations
Solution Approach 2:
The device transitions from a symmetric closed ring shape to an asymmetric ring segment shape with an opening. This asymmetry enables the device to accommodate substrates with non-rotationally symmetrical cross-sections, allowing uniform electron treatment across diverse substrate geometries that would not fit symmetric closed ring configurations
2Manufacturing precision
If multiple pass treatment is used for bulk material, then all-side electron impact is achieved, but treatment time increases significantly
Solution Approach 1:
The device transitions from linear or planar electron beam configurations to a three-dimensional ring segment geometry. This dimensional change enables electrons to impinge on substrates from multiple directions simultaneously in a single pass, achieving uniform all-side treatment without requiring multiple sequential passes, thereby maintaining high productivity
3Reliability
If thermionic cathode systems are used, then electron beam generation is achieved, but mechanical complexity and cost increase
Solution Approach 1:
The patent replaces complex thermionic cathode mechanical systems with a simpler electron source configuration integrated into the ring segment structure. This substitution reduces mechanical complexity while maintaining reliable electron beam generation through the streamlined device architecture that eliminates the need for complex cathode heating and vacuum systems
4Manufacturing precision
If electron exit window is made robust for high voltage, then sufficient treatment depth is achieved, but window damage risk increases
Solution Approach 1:
The device enables dynamic adjustment of operating parameters including voltage and ring segment configuration. This dynamic capability allows optimization of treatment depth while operating at reduced voltage levels that decrease stress on the electron exit window, thereby reducing damage risk while maintaining sufficient treatment effectiveness through multiple directional electron impingement
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables uniform electron treatment of substrates with non-rotationally symmetrical cross-sections in a single pass, reduces equipment costs, and allows for treatment of larger substrates and fluids, while maintaining accessibility for maintenance.
Implementation Method 1
at least one first cathode and at least one first anode, between which a glow discharge plasma can be generated in the evacuatable space 102
Implementation Method 2
at least one second cathode and at least one second anode, between which a second electrical voltage is connected by means of a second power supply device. The second cathode 107 represents the cathode for emitting secondary electrons, which are then accelerated
Data Source
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AI summary
The invention relates to an apparatus for generating accelerated electrons, comprising: a housing (101), which delimits an evacuable space (102a; 102b) and has an electron exit window (104); an inlet for feeding a working gas into the evacuable space (102); at least one first cathode (105a; 105b) and at least one first anode, between which a glow discharge plasma (106) can be generated in the evacuable space (102a) by means of a first applied voltage, wherein ions from the glow discharge plasma (106) can be accelerated onto the surface (110) of a second cathode (107) and electrons emitted by the second cathode (107) can be accelerated toward the electron exit window (104) by means of a second voltage applied between the second cathode (107) and a second anode (108), wherein the housing (101), the second cathode (107), and the electron exit window (104) are designed as a ring segment, and wherein the surface perpendiculars of the electron exit window (104) and of the surface region (110) of the second cathode (107) from which the electrons are emitted are oriented towards the ring interior of the ring-segment-shaped housing (101). Furthermore, the space (102a) is divided into partial segments (113) by means of walls (112), wherein each partial segment (113) has at least one wire-shaped electrode (111), which extends through the partial segment (113), and at least one separate power supply device is associated with each partial segment (113), by means of which power supply device the strength of the electric current that flows through the at least one electrode (213) of the partial segment in question can be set.