Rinse Arm Position Detection for Stable Wafer Rinsing
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Solution Overview
Problem
The movement of rinse arms in semiconductor developing chambers can cause mechanical collisions, leading to positional displacement and instability, resulting in non-uniform rinse solution distribution and residue formation on wafers, which affects subsequent processing steps.
Innovation Solution
A position detection system is implemented to monitor the rinse arm's position during operational stages, ensuring alignment with predefined positions and sending alerts for timely maintenance when deviations occur.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the rinse arm moves to perform rinsing operations, then the rinse process can be applied to the wafer, but mechanical collisions cause positional displacement and instability
Solution Approach 1:
The patent implements a feedback mechanism using sensors to detect the position of the rinse arm and provide real-time information to the control system. The control system adjusts the rinse arm position based on sensor feedback, ensuring accurate positioning while preventing mechanical collisions that cause instability.
Solution Approach 2:
The patent replaces pure mechanical positioning with an integrated sensor-based detection and control system. Instead of relying solely on mechanical precision, the system uses optical or proximity sensors to detect position and electronically control the rinse arm movement, reducing mechanical wear and collision-related instability.
2Reliability
If the rinse arm position is not precisely controlled, then mechanical collisions are reduced, but non-uniform rinse solution distribution and residue formation occur
Solution Approach 1:
Sensors continuously monitor the rinse arm position and provide feedback to the control system, enabling real-time adjustments to maintain precise positioning. This ensures uniform rinse solution distribution while preventing the mechanical collisions that would otherwise cause instability.
Solution Approach 2:
The system dynamically adjusts operational parameters such as rinse arm speed, position, and rinse solution flow rate based on real-time position detection. By changing these parameters adaptively, the system achieves both stable positioning and uniform rinse solution distribution without mechanical collisions.
3Measurement precision
If continuous monitoring of rinse arm position is implemented, then positioning accuracy is maintained, but system complexity increases
Solution Approach 1:
The patent introduces sensors as intermediary devices between the rinse arm and the control system. These sensors act as mediators that convert physical position information into electrical signals for the control system, enabling accurate position detection without requiring complex direct measurement mechanisms.
Solution Approach 2:
The system replaces complex mechanical measurement devices with simpler sensor-based detection. Instead of using elaborate mechanical encoders or position sensors, the patent employs optical or proximity sensors that provide accurate position information with simpler construction and lower maintenance requirements.
Data Source
AI summary
A method includes placing a semiconductor substrate in a developing chamber; rotating a rinse arm, with a rinse nozzle, in the developing chamber based on a vertical axis; detecting a positioning status of the rinse arm through a position detection system; determining whether the positioning status of the rinse arm is acceptable through the position detection system; in response to the determination determines that the positioning status of the rinse arm is acceptable, performing a rinse process on the semiconductor substrate through the rinse nozzle installed on the rinse arm.