Roll Brush Speed Zoning for Uniform Substrate Cleaning
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Solution Overview
Problem
Existing substrate cleaning apparatuses face challenges in effectively removing particles and debris from substrates after planarization processes, such as CMP, due to uneven cleaning efficiency across the substrate surface.
Innovation Solution
A substrate cleaning apparatus featuring a roll brush module with a drive shaft and brush members, where the center brush member rotates at a lower speed than the side brush members, ensuring uniform cleaning pressure and efficiency across the substrate surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a uniform rotation speed is applied to all brush members, then the structure is simple, but cleaning efficiency becomes uneven across the substrate surface
Solution Approach 1:
The patent applies different rotation speeds to different brush members based on their position. The center brush member rotates at a different speed than the side brush members, creating local quality variations that optimize cleaning efficiency for each region of the substrate surface.
Solution Approach 2:
The system transitions from a static uniform speed configuration to a dynamic differentiated speed configuration. Each brush member can rotate at independently controlled speeds, allowing the system to adapt to the varying cleaning requirements across different areas of the substrate.
2Stress or pressure
If brush members rotate at high speed, then cleaning pressure is sufficient, but contact time becomes too short for effective particle removal
Solution Approach 1:
The patent changes the rotation speed parameter of brush members based on their position and function. By adjusting the speed parameter, the system optimizes the balance between cleaning pressure (proportional to speed) and contact time (inversely proportional to speed), achieving effective particle removal without substrate damage.
3Productivity
If all brush members rotate at the same speed, then the control system is simple, but edge regions of the substrate are not cleaned effectively
Solution Approach 1:
The patent implements local quality by assigning different rotation speeds to the center brush member and side brush members. This differentiation ensures that edge regions receive appropriate cleaning attention, with the side brush members operating at speeds optimized for their peripheral positioning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves effective cleaning of substrates by maintaining sufficient cleaning pressure while preventing damage from excessive contact time, ensuring thorough removal of particles even in edge regions.
Implementation Method 1
a plurality of brush members 210, 220 disposed around an outside circumference of the drive shaft 200
Implementation Method 2
cleaning a surface of the substrate S
Data Source
AI summary
An example substrate cleaning apparatus includes a roll brush that cleans a surface of a substrate. The roll brush includes a drive shaft with a predetermined length and a plurality of brush members positioned around an outside circumference of the drive shaft. One of the plurality of the brush members is provided with a rotation speed lower than the others.