Roll-Type Imprint Master Mold for Large-Area Wire Grid Polarizers
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Solution Overview
Problem
The yield of the imprint process for large-area display apparatuses, such as wire grid polarizers, is difficult to improve with conventional methods, leading to inefficiencies in manufacturing.
Innovation Solution
A roll type imprint master mold with a cylindrical shape, featuring a base layer of polyimide or polyamide and a pattern layer made of inorganic insulation materials like silicon oxide, silicon nitride, or silicon oxynitride, is developed, along with a method of manufacturing that includes multiple mask and resin pattern formations and etching processes to create a wire grid polarizer pattern with fine protrusions, which is then attached to a metal roll body for improved imprinting.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional imprint methods are used for large-area display apparatuses, then the manufacturing process can be completed, but the process yield is difficult to improve leading to manufacturing inefficiencies
Solution Approach 1:
The patent segments the imprint mold into modular components: a flexible base layer that can be conformally attached to large-area substrates, and a separate pattern layer containing the wire grid structure. This segmentation allows the pattern layer to be manufactured with high precision using conventional lithography, while the base layer provides flexibility for large-area coverage, thereby improving yield without excessive complexity
Solution Approach 2:
The patent transitions from planar imprint molds to a three-dimensional roll-type configuration where the base layer wraps around a cylindrical mandrel. This dimensional change enables continuous imprinting across large areas by rolling the mold over the substrate, significantly improving productivity while maintaining manufacturing feasibility through standardized rolling processes
2Ease of manufacture
If additional film molds are used in the imprint process, then the imprinting can be performed, but the manufacturing process becomes more complex
Solution Approach 1:
The patent merges the base layer and pattern layer into a single integrated roll-type mold structure. The pattern layer is directly formed on the base layer through conformal deposition and lithography, eliminating the need for separate film molds. This integration simplifies the manufacturing process by reducing the number of components and assembly steps while maintaining the functional requirements for large-area imprinting
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the yield of the imprint process by allowing for efficient formation and attachment of a wire grid polarizer pattern on a large area, improving the durability and simplifying the manufacturing process by direct imprinting on the display substrate without additional film molds, while maintaining high reflectance for efficient ultraviolet radiation.
Implementation Method 1
forming a pattern layer in the first area by etching the inorganic insulation layer using the first resin pattern and the first mask pattern as a mask
Implementation Method 2
disposing a resin layer on the substrate, forming a resin pattern from the resin layer, and curing the resin layer to form a cured resin layer
Data Source
AI summary
A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.