Transparent Roller Liquid Flow for Debris-Free Laser Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing laser processing apparatuses face issues with debris scattering and adhesion during ablation processing, which lowers processing quality, and previous solutions like using liquid resin or water immersion introduce productivity and economic inefficiencies or bubble obstruction problems.
Innovation Solution
A laser processing apparatus with a holding unit, a laser beam applying unit, and a liquid supply mechanism that includes a transparent plate, a rotating roller, and nozzles to create a liquid flow, preventing debris adhesion and bubble obstruction by applying the laser beam through the liquid flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid resin is applied to the front surface of the wafer to prevent debris adhesion, then processing quality is improved, but productivity deteriorates due to additional coating and removal steps
Solution Approach 1:
The patent extracts only the essential function of liquid resin (preventing debris adhesion) while eliminating the cumbersome steps of application and removal. The liquid supply mechanism delivers liquid precisely to the processing area, and the liquid is removed automatically by downstream conveyance, keeping the system simple and productive.
Solution Approach 2:
The liquid supply mechanism is designed to be self-regulating, where the liquid flows automatically to the processing area and is carried away by the same liquid flow system without requiring separate removal mechanisms. The system serves itself by using the processing liquid for both protection and cleanup functions.
2Manufacturing precision
If the wafer is immersed in water during laser processing to prevent debris adhesion, then processing quality is improved, but bubble obstruction occurs that prevents desired processing
Solution Approach 1:
Instead of immersing the entire wafer in water, the patent applies liquid locally only to the processing area through the liquid supply mechanism. This localized approach provides debris protection where needed while avoiding bubble formation that would obstruct the laser beam.
Solution Approach 2:
The liquid supply mechanism creates a dynamic liquid flow that continuously moves across the processing area. This dynamic flow prevents bubble accumulation by constantly refreshing the liquid, ensuring the laser beam remains unobstructed while maintaining debris protection.
3Manufacturing precision
If liquid is supplied continuously to prevent debris adhesion, then processing quality is improved, but liquid consumption increases causing economic inefficiency
Solution Approach 1:
The liquid supply mechanism maintains continuous liquid flow during processing, ensuring uninterrupted debris protection. The liquid is supplied continuously but in controlled amounts, and the same liquid serves multiple purposes throughout the process, maximizing its utility and minimizing waste.
Solution Approach 2:
The liquid that flows through the processing area and carries debris away is collected and can be reused. The system is designed to recover and recycle the liquid, converting what would be waste into a reusable resource, thereby reducing overall liquid consumption and improving economic efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures uninterrupted laser beam application and prevents debris adhesion to the workpiece, maintaining processing quality without the need for liquid resin coating or water immersion, thus enhancing productivity and economic efficiency.
Implementation Method 1
a condenser condensing the laser beam emitted from the laser oscillator to apply the laser beam to the workpiece held on the holding table through the transparent plate, the roller, and the liquid supplied into the gap
Implementation Method 2
a roller formed of a transparent member that is disposed in a non-contact state at a position proximate to the upper surface of the workpiece held on the holding table inside the liquid chamber and that produces a flow of a liquid on the workpiece
Implementation Method 3
a roller formed of a transparent member that is disposed in a non-contact state at a position proximate to the upper surface of the workpiece held on the holding table inside the liquid chamber and that produces a flow of a liquid on the workpiece
Data Source
AI summary
A liquid supply mechanism disposed at an upper portion of a holding unit includes a liquid chamber having a transparent plate positioned to form a gap between itself and an upper surface of a workpiece held on a holding table, a roller formed of a transparent member that is disposed in a non-contact state at a position proximate to an upper surface of the workpiece held on the holding table inside the liquid chamber and that produces a flow of a liquid on the workpiece; a motor rotating the roller, a liquid supply nozzle supplying the liquid into the gap from one side of the liquid chamber, and a liquid discharge nozzle discharging the liquid from the other side of the liquid chamber. A laser beam is applied to the workpiece through the transparent plate, the roller, and the liquid supplied into the gap.