Roller Mold Electron Beam Exposure Runout Compensation
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Solution Overview
Problem
Rotational runout of roller molds during the exposure process leads to misalignment and unclear patterns, which existing technologies struggle to address without increasing costs or complexity.
Innovation Solution
A roller mold manufacturing device that includes an electron beam irradiation system, a displacement amount detection sensor, a control device, and an actuator to dynamically adjust the electron beam position in real-time, compensating for rotational runout and minimizing pattern misalignment, while avoiding the use of costly aerostatic pressure bearings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a general purpose bearing is used during exposure while rotating a roller mold, then the device complexity is reduced and cost is lowered, but rotational runout occurs in the vertical direction causing misalignment and unclear patterns
Solution Approach 1:
The patent employs a feedback control system where a displacement sensor detects the actual position of the roller mold during rotation, and this information is fed back to a control device that adjusts the electron beam position accordingly. This closed-loop feedback mechanism compensates for rotational runout without requiring high-precision bearings, thus resolving the contradiction between device simplicity and pattern alignment precision.
Solution Approach 2:
The patent dynamically changes the position parameters of the electron beam irradiation device in real-time based on detected roller position deviations. By adjusting beam coordinates according to actual roller displacement, the system maintains precise pattern deposition despite mechanical runout, eliminating the need for expensive aerostatic pressure bearings.
2Manufacturing precision
If electron beams are focused on a lens for one-rotation depiction, then depiction precision is improved, but the region where depiction is possible at a time is small resulting in small throughput
Solution Approach 1:
The patent transitions from a static focused beam system to a dynamic multi-beam system. The electron beam is dynamically controlled to generate multiple parallel beams that can simultaneously irradiate different regions of the roller mold, enabling broad-area deposition while maintaining precision through real-time position adjustment based on feedback from displacement sensors.
Solution Approach 2:
The patent segments the single electron beam into multiple parallel beams, allowing simultaneous exposure of multiple regions on the roller mold. This segmentation approach enables the system to cover the entire roller surface in one rotation rather than requiring multiple rotations, thereby significantly increasing throughput while maintaining depiction precision through coordinated beam control.
3Productivity
If a stencil mask is used with parallel electron beams for simultaneous depiction, then throughput is increased, but the output at each irradiation position is not high requiring multi-rotation depiction at low speed
Solution Approach 1:
The patent ensures continuous useful action by maintaining high-intensity electron beam irradiation throughout the entire exposure process. Unlike multi-rotation approaches where the beam must be repeatedly repositioned, the system achieves continuous high-output irradiation across the entire roller surface in one rotation through coordinated multi-beam control, eliminating idle time and maintaining constant deposition quality.
4Manufacturing precision
If the beam irradiation time is lengthened to achieve adequate output, then depiction quality is improved, but the exposure time increases reducing productivity
Solution Approach 1:
The patent performs preliminary positioning and coordination of multiple electron beams before irradiation begins. The control device pre-calculates and pre-positions all beams based on the roller mold position and pattern requirements, so that when irradiation starts, all beams are already optimally positioned. This preliminary action eliminates the need for prolonged exposure times while maintaining high depiction quality through immediate high-intensity irradiation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses pattern misalignment caused by rotational runout, maintaining pattern clarity without incurring significant cost increases, and allows for high-throughput production of precise roller molds with reduced operational complexity.
Implementation Method 1
an electron beam irradiation device which irradiates, with electron beams, the roller mold coated with a resist
Data Source
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AI summary
A phenomenon where a depicted pattern becomes unclear owing to a rotational runout of a roller mold in the direction of a rotary shaft is suppressed while restraining an increase in the cost. For the purpose of achieving the above, a roller mold manufacturing device (1) is provided with an electron beam irradiation device (2); a mask (3) which has an opening that allows passage of some of electron beams, and which forms a plurality of beams that perform simultaneous depiction on a resist; a rotation drive device (4) which rotates a roller mold (100) around a rotary shaft (8); a displacement amount detection sensor (5) which detects a rotational runout displacement amount of the roller mold (100) in the direction of the rotary shaft (8); a control device (6); and an actuator (7) which, based on a control signal from the control device (6), allows a depiction position by the electron beams to follow the displacement of the roller mold (100) in the direction of the rotary shaft (8), wherein misalignment of an exposed position of the resist, which is caused by rotational runout displacement of the roller mold (100) in the direction of the rotary shaft (8), is suppressed.