Processing Liquid Roller Downstream Wall Adjustment Mechanism
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Solution Overview
Problem
Conventional processing liquid applying apparatuses fail to adjust the applying amount of processing liquid effectively on a transfer roller for both transfer and cleaning modes, leading to suboptimal image formation and cleaning performance due to fixed spacing between the abutting member and the roller.
Innovation Solution
Incorporating a downstream wall moving mechanism that adjusts the distance between the downstream wall and the processing liquid transfer roller, allowing for increased or decreased applying amount based on the mode of operation, enabling precise control of processing liquid application in both transfer and cleaning modes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the spacing distance between the abutting member and the applying roller is kept constant, then the structure is simple, but the applying amount of processing liquid cannot be adjusted for different modes
Solution Approach 1:
The abutting member is made movable in the tangential direction of the applying roller through a moving mechanism, allowing the spacing distance to be dynamically adjusted between a first spacing distance (for transfer mode) and a second spacing distance (for cleaning mode), enabling adaptability without excessive structural complexity
Solution Approach 2:
The abutting member serves dual functions: in transfer mode it applies processing liquid at a first spacing distance, and in cleaning mode it applies processing liquid at a second spacing distance, allowing one component to handle multiple operational requirements
2Productivity
If the applying amount of processing liquid is excessively increased, then the cleaning effect is improved, but the drying time increases and the next transfer process is inhibited
Solution Approach 1:
The spacing distance parameter is changed between two discrete values: a first spacing distance for transfer mode that provides controlled application, and a second spacing distance for cleaning mode that increases applying amount for effective cleaning, allowing optimization for each specific operational requirement
3Ease of manufacture
If the abutting member is moved in the tangential direction during roller rotation, then the structure is simple, but the spacing distance is undesirably widened and the applying amount is increased
Solution Approach 1:
The moving mechanism that adjusts the abutting member position is driven by a motor rather than relying on roller rotation to move the member, allowing precise control of the spacing distance and eliminating the unwanted widening effect while maintaining ease of construction
Data Source
AI summary
A processing liquid applying apparatus includes a processing liquid transfer roller which transfers a processing liquid to a transfer medium while rotating in a predetermined direction; a processing liquid applying section which applies the processing liquid to a surface of the processing liquid transfer roller; a downstream wall which is positioned on a downstream side in a rotating direction of the processing liquid transfer roller with respect to the processing liquid applying section; and a downstream wall moving mechanism which moves the downstream wall between a downstream wall first position at which the downstream wall is positioned when the processing liquid is transferred to the transfer medium and a downstream wall second position at which the downstream wall is positioned when the surface of the processing liquid transfer roller is washed with the processing liquid.