Rotary Magnetron Cathode With Individually Adjustable Magnetic Field
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Solution Overview
Problem
Existing magnetron sputtering systems with rotary cathodes face challenges in precisely controlling the magnetic field and plasma intensity, leading to non-uniform coating thickness across substrates, which requires frequent adjustments and increases operational costs.
Innovation Solution
A magnetron assembly with individually adjustable magnets and yokes, controlled by separate actuating mechanisms, allows for precise manipulation of the magnetic field intensity and shape, enabling local correction of coating non-uniformities during the sputtering process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If magnets are attached to a single yoke and the magnet bar structure is bent to modify the magnetic field, then the magnetic field shape can be modified, but the precise control of magnetic field shape and intensity in a specific location is restrained
Solution Approach 1:
The patent divides the magnetron assembly into multiple independent magnet-yoke units, where each magnet is attached to its own separate yoke rather than a single shared yoke. This segmentation allows each magnet-yoke pair to be independently positioned and adjusted, enabling precise control of magnetic field shape and intensity at specific locations along the substrate without the constraints of bending a single magnet bar structure.
Solution Approach 2:
The patent implements actuating mechanisms that enable dynamic adjustment of each magnet-yoke unit's position during operation. This dynamic capability allows the magnetic field configuration to be modified in real-time to correct coating non-uniformities, transforming the static magnetic field into a dynamically adjustable one that can adapt to specific process requirements.
2Power
If the distance between target surface and magnets is reduced due to target erosion, then the magnetic field intensity is increased, but local alterations of plasma lead to non-uniform coating across the substrate
Solution Approach 1:
The patent applies local quality by allowing different regions of the substrate to have different magnetic field intensities through independent adjustment of each magnet-yoke unit. When target erosion causes increased overall magnetic field intensity, the actuating mechanisms can locally reduce the distance for specific magnets to maintain appropriate field strength in those regions, while other magnets maintain larger distances to prevent excessive field intensity in already well-coated regions, thereby preventing plasma alterations and coating non-uniformities.
Solution Approach 2:
The patent changes the parameter of magnet-to-target distance dynamically through actuating mechanisms. Instead of maintaining a fixed distance that leads to non-uniform coating when target erosion occurs, the system adjusts the distance of individual magnets based on real-time feedback or pre-programmed corrections, modifying the magnetic field intensity parameter locally to maintain consistent plasma conditions and coating uniformity across the substrate.
3Manufacturing precision
If multiple actuators are used to control individual magnets and yokes, then precise control of magnetic field is achieved, but device complexity increases
Solution Approach 1:
The patent employs universal actuating mechanisms that can be replicated across multiple magnet-yoke units using the same design and control architecture. This multi-functionality approach allows the system to achieve precise control of multiple magnets through standardized actuators rather than custom solutions for each magnet, reducing overall system complexity while maintaining high precision control capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances coating uniformity by allowing precise control of magnetic field intensity and shape, reducing operational costs and time through automated adjustments.
Implementation Method 1
a magnetron is directed at a substrate, within a vacuum chamber, producing and holding a plasma in a desired location
Implementation Method 2
Magnetron sputtering with rotary cathodes has long been employed in the glass coating industry since it has been proved to maximize target material usage while creating uniform coating films
Data Source
AI summary
A rotary cathode assembly for a magnetron sputtering apparatus is provided. The rotary cathode assembly includes a magnetron assembly having a plurality of magnets attached to a plurality of yokes, a plurality of driving modules each comprising an actuating mechanism operatively coupled to at least one of the plurality of yokes, and a protective tube, wherein the plurality of driving modules are adapted for adjusting the position of the plurality of yokes individually. The rotary cathode assembly further includes a hollow target cathode enclosing the protective tube and defining a passage formed between an inner surface of the hollow target cathode and an outer surface of the protective tube, wherein the ends of the target cathode assembly are configured to be rotatably attachable to the magnetron sputtering apparatus.