Rotary Magnetron Assembly With Adjustable Yokes for Uniform Sputtering
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Solution Overview
Problem
Magnetron sputtering with rotary cathodes faces challenges in maintaining uniform coating thickness due to target erosion, which increases magnetic field intensity and leads to non-uniform plasma alterations, limiting precise control over coating deposition rates and uniformity.
Innovation Solution
A magnetron assembly with individually adjustable magnets attached to yokes, allowing for precise control of magnetic field intensity and shape through separate actuation mechanisms, enabling local correction of coating non-uniformities during operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If magnets are attached to a single yoke and the magnet bar structure is bent to modify the magnetic field, then the magnetic field shape can be modified, but the precise control of magnetic field shape and intensity in a specific location is restrained
Solution Approach 1:
The magnetron assembly divides the magnet structure into multiple independent yokes, each carrying a set of magnets. This segmentation allows each yoke to be independently positioned relative to the target, enabling precise local control of magnetic field intensity and shape at specific locations without affecting the entire magnet bar structure.
Solution Approach 2:
The invention introduces drive modules with actuation mechanisms that enable dynamic adjustment of each yoke's position. This dynamic capability allows real-time modification of magnetic field characteristics during sputtering operation, providing precise control over plasma distribution and coating uniformity.
2Power
If the distance between target surface and magnets is reduced due to target erosion, then the magnetic field intensity is increased, but local alterations of plasma lead to non-uniform coating
Solution Approach 1:
The invention applies local quality by allowing different sections of the magnetron assembly to have different magnetic field intensities. Each yoke can be independently positioned to compensate for local variations in target erosion, creating non-uniform magnetic field distribution that counteracts the non-uniform plasma alterations and maintains uniform coating thickness across the substrate.
Solution Approach 2:
The system incorporates feedback mechanisms where coating thickness measurements are used to adjust yoke positions. This feedback loop enables real-time correction of coating non-uniformities by modifying the magnetic field intensity distribution in response to actual coating conditions.
3Manufacturing precision
If corrections and adjustments are made during sputtering operation to maintain coating thickness uniformity, then coating uniformity is improved, but operational time and costs increase
Solution Approach 1:
The invention enables preliminary action by allowing yoke positions to be pre-adjusted based on predicted target erosion patterns or pre-programmed correction schedules. This proactive approach reduces the need for frequent reactive adjustments during operation, minimizing operational interruptions while maintaining coating uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances coating thickness uniformity, reduces operational costs, and increases efficiency by allowing real-time adjustments to the magnetic field, thereby improving the precision and consistency of the coating process.
Implementation Method 1
a magnetron directed at a substrate, within a vacuum chamber, producing and holding a plasma in a desired location for coating the target material onto a substrate
Implementation Method 2
A magnetron assembly with individually adjustable magnets attached to yokes, allowing for precise control of magnetic field intensity and shape through separate actuation mechanisms
Implementation Method 3
Magnetron sputtering with rotary cathodes has long been employed in the glass coating industry since it has been proved to maximize target material usage while creating uniform coating films
Data Source
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AI summary
A magnetron assembly (202) for magnetron sputtering with rotary cathode systems is provided. The magnetron assembly (202) comprises a plurality of magnets (205) attached to a plurality of yokes (206) and a plurality of driving modules (207), each comprising an actuating mechanism (208) operatively coupled to at least one of the plurality of yokes (206). The plurality of driving modules (207) are adapted for adjusting the position of the plurality of yokes (206) individually.