Rotary Magnetron Assembly with Movable Magnet Bar for Sputtering

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Solution Overview

Problem

The challenge in rotating-target magnetron sputtering is maintaining long-term stability and controlling magnetic flux as the target erodes, leading to variations in plasma confinement and sputtering efficiency, especially in reactive sputtering processes where precise film chemistry is required.

Innovation Solution

A magnetron assembly for rotary target cathodes with a movable magnet bar structure and motorized actuation mechanisms, coupled with a controller and battery module, allows for real-time adjustment of the magnetic field to compensate for target erosion, using internal motors, piezo-electric motors, or pneumatic/hydraulic systems, and enables remote communication through various signal methods to maintain process stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If target thickness is increased to improve economy and extend production campaigns, then the amount of usable material increases, but magnetic flux at the target surface becomes inadequate

Engineering Contradiction:
Improveamount of usable materialVSAvoidmagnetic flux at target surface
Core Design Contradiction:
Quantity of substanceVSUse of energy by moving object

Solution Approach 1:

The magnetron assembly is made dynamically adjustable through motorized mechanisms that can change the position of magnetic components and modify magnetic field strength in real-time. This allows the system to adapt to varying target thicknesses and maintain optimal magnetic flux throughout the sputtering process.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes operational parameters including magnetic field strength, magnetron voltage, and gas flow rates to compensate for target erosion and thickness variations. These parameter adjustments ensure consistent sputtering performance regardless of target material quantity.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If standard magnetron assemblies are used with thicker targets, then fabrication cost is reduced, but magnetic flux becomes inadequate for maintaining plasma confinement

Engineering Contradiction:
Improvefabrication costVSAvoidmagnetic flux sufficiency
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

Rather than using fixed, over-designed magnetron assemblies, the invention employs dynamically adjustable components that can be optimized for each specific target thickness. This reduces fabrication costs while maintaining reliable magnetic flux through real-time adjustment capabilities.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The magnetron assembly includes self-adjusting mechanisms with sensors that monitor plasma conditions and automatically modify magnetic field parameters to maintain optimal operation, eliminating the need for conservative over-design.

Inventive Principle:
Principle #25Self-service

3Manufacturing precision

If reactive gas amount is increased to achieve desired film chemistry, then film composition is improved, but target surface reactions increase and ablation rate decreases

Engineering Contradiction:
Improvefilm chemistry controlVSAvoidablation rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system dynamically adjusts multiple parameters including reactive gas flow rates, magnetron power, and magnetic field strength to achieve the desired film chemistry while maintaining acceptable ablation rates. These coordinated parameter changes allow optimization of both film quality and productivity.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

Real-time monitoring of film composition and sputtering rate provides feedback that drives automatic adjustments of reactive gas admission and power delivery, maintaining optimal balance between film chemistry and ablation rate throughout the process.

Inventive Principle:
Principle #23Feedback

4Duration of action of moving object

If target erosion is allowed to proceed naturally, then production campaigns can run longer, but magnetic field strength increases and plasma confinement varies

Engineering Contradiction:
Improveproduction campaign lengthVSAvoidplasma confinement stability
Core Design Contradiction:
Duration of action of moving objectVSStability of the object's composition

Solution Approach 1:

The magnetron assembly incorporates dynamic adjustment mechanisms that compensate for target erosion by modifying magnetic field parameters in real-time. This maintains stable plasma confinement throughout extended production campaigns despite changing target geometry.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

Sensors monitor plasma conditions and target erosion progress, providing feedback that drives automatic adjustments of magnetic field strength and configuration to maintain consistent plasma confinement and sputtering performance throughout the target lifetime.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution ensures consistent magnetic flux and improved sputtering efficiency by dynamically adjusting the magnetic field as the target erodes, enhancing the stability and control of the sputtering process, particularly in reactive sputtering, and allowing for longer production campaigns without significant cost increases.

Implementation Method 1

A magnetron assembly is disposed within the tube and supplies magnetic flux, which permeates the target such that there is adequate magnetic flux at the outer surface of the target. The magnetic field produced by the magnetron assembly is designed in a way such that it retains electrons emitted from the target so as to increase the probability that they will have ionizing collisions with the working gas

Methodology Applied
Scientific EffectMagnetic field: Magnetic Field

Implementation Method 2

drive modules each including a motorized actuation mechanism operatively coupled to the magnet bar structure

Methodology Applied
Scientific EffectElectromagnetic conversion: Electromagnetic Induction

Implementation Method 3

the battery configured to energize each motorized actuation mechanism and the electronic controller

Methodology Applied
Scientific EffectBattery energy storage: Battery (electricity)

Implementation Method 4

one or more power generation modules coupled to the support structure and in electrical communication with the battery such that electrical energy output from the power generation modules recharges the battery

Methodology Applied
Scientific EffectElectrical energy generation: Electromagnetic Induction

Data Source

PatentEP3137646B1Sputtering apparatus
Publication Date: 2020.02.19 SPUTTERING COMPONENTS INC
  • EP3137646B1 patent drawingFigure 1~3
  • EP3137646B1 patent drawingFigure 4~6
  • EP3137646B1 patent drawingFigure 7~8

AI summary

A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.