Rotary Substrate Support for Precise Photomask Alignment

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Solution Overview

Problem

Conventional methods for rotating and aligning photomasks in laser printing systems are overly complex and lack precision, leading to issues with edge sharpness and directional bias in pattern illumination.

Innovation Solution

A substrate support system with a rotary assembly, bellows assembly, lever, and chuck assembly that allows for precise rotational and axial movement of the substrate, facilitated by a gas source for lifting and vacuum chucking to maintain alignment, and an edge finder for accurate positioning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional methods are used to rotate and align the photomask, then the alignment function is achieved, but the system becomes overly complex and precision is reduced

Engineering Contradiction:
Improvealignment precisionVSAvoidalignment system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The alignment system is segmented into distinct functional modules: a rotary assembly for rotation, a bellows assembly for vertical movement, and a chuck assembly for substrate holding. Each module performs a specific function, allowing independent optimization and simplifying the overall system while maintaining high precision alignment capability

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The bellows assembly acts as an intermediary component between the rotary assembly and the chuck assembly, enabling vertical movement and isolation of the chuck assembly from direct mechanical coupling to the rotation mechanism. This intermediary structure simplifies the overall system by decoupling rotational and vertical degrees of freedom

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the propagation direction and scanning direction are not collinear, then the scanning process can proceed, but edge sharpness is reduced and directional bias is created

Engineering Contradiction:
Improvescanning speedVSAvoidpattern edge sharpness
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system incorporates an edge finder that detects the position of photomask edges and provides feedback to the control system. This feedback mechanism enables real-time adjustment of the photomask orientation to ensure collinearity between the laser propagation direction and scanning direction, maintaining pattern edge sharpness while enabling continuous scanning operation

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The chuck assembly is designed with dynamic rotational capability, allowing the photomask to be rotated and reoriented during the scanning process. This dynamic adjustment capability enables the system to maintain optimal alignment (collinearity) between laser beams and scanning direction throughout the printing process, ensuring high manufacturing precision

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances precision and simplifies the alignment process, reducing complexity and improving the sharpness of pattern edges by ensuring collinearity between laser beams and substrate orientation.

Implementation Method 1

facilitated by a gas source for lifting

Methodology Applied
Scientific EffectGas pressure: Pressure Increase

Implementation Method 2

vacuum chucking to maintain alignment

Methodology Applied
Scientific EffectVacuum: Vacuum

Data Source

PatentUS12449738B2Rotary substrate support for aligning a substrate
Publication Date: 2025.10.21 APPLIED MATERIALS INC
  • US12449738B2 patent drawing
  • US12449738B2 patent drawing
  • US12449738B2 patent drawing

AI summary

Embodiments of substrate supports for aligning a substrate are provided herein. In some embodiments, a substrate support for aligning a substrate include: a base plate; a rotary assembly including a stator coupled to the base plate and a rotor rotatably coupled to the stator via a bearing disposed therebetween; a bellows assembly fixed to the rotor; and a lever having a first end coupled to the rotor and a second end configured to be coupled to an actuator; and a chuck assembly disposed atop the base plate and fixedly coupled to the bellows assembly, wherein the chuck assembly is rotationally and axially movable along a central axis with respect to the base plate, and wherein rotation of the lever about the central axis rotates the bellows assembly and the chuck assembly with respect to the base plate to align the substrate with respect to the base plate.