Rotary Table Substrate Processing for Dual-Surface Uniformity
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Solution Overview
Problem
Existing substrate processing systems require separate apparatuses for grinding and processing the first and second main surfaces of a substrate, leading to inefficiencies and increased complexity in managing both surfaces uniformly.
Innovation Solution
A substrate processing apparatus with a rotary table that holds and processes both main surfaces of a substrate using pairs of substrate chucks and processing units, allowing for simultaneous processing of both surfaces on a single rotary table, including a first processing unit for the first main surface and a second processing unit for the second main surface, with tilt angle adjustments and cleaning mechanisms to ensure uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate apparatuses are used for processing the first and second main surfaces of substrates, then each surface can be processed independently, but the device complexity and number of apparatuses increase
Solution Approach 1:
The patent combines two separate substrate processing apparatuses into a single apparatus with one rotary table that can hold and process both the first and second main surfaces of substrates. The rotary table includes multiple substrate chucks positioned at different locations, allowing simultaneous or sequential processing of both surfaces without requiring separate apparatuses, thereby reducing device complexity while maintaining processing quality
Solution Approach 2:
The rotary table is designed with multi-functionality to perform multiple processing tasks. It can hold substrates in different orientations (first main surface facing up or second main surface facing up) and transfer them to different processing units. This universal design allows a single apparatus to replace multiple specialized apparatuses, reducing the number of devices needed while maintaining the ability to process both surfaces effectively
2Reliability
If separate apparatuses are used for processing both main surfaces, then processing can be specialized for each surface, but productivity decreases due to multiple apparatuses
Solution Approach 1:
By merging the processing capabilities for both main surfaces into a single apparatus, the patent enables continuous processing without the need to transfer substrates between separate apparatuses. The rotary table can sequentially or simultaneously process both surfaces in one integrated system, improving productivity by eliminating idle time and transfer operations while maintaining processing uniformity through consistent processing conditions
Solution Approach 2:
The rotary table design enables continuous processing of both main surfaces by keeping substrates in the apparatus throughout the entire processing sequence. Substrates can be processed on the first main surface, then rotated and processed on the second main surface without leaving the apparatus, ensuring continuous useful action and eliminating downtime associated with transferring between separate apparatuses, thereby improving overall productivity
Data Source
AI summary
A substrate processing apparatus includes a pair of first substrate chucks each configured to hold a substrate from below while allowing a first main surface of the substrate to face upwards; a pair of second substrate chucks each configured to hold the substrate from below while allowing a second main surface of the substrate opposite to the first main surface to face upwards; a rotary table which is configured to be rotated about a rotation axis; a first processing unit equipped with a first processing tool configured to process the first main surface of the substrate held by the first substrate chuck; and a second processing unit equipped with a second processing tool configured to process the second main surface of the substrate held by the second substrate chuck.