Rotary Table Deposition Heating for Uniform Substrate Temperature
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Solution Overview
Problem
Existing deposition apparatuses face challenges in achieving uniform in-plane temperature distribution across substrates during the deposition process, leading to inconsistencies in film quality and process control.
Innovation Solution
A deposition apparatus equipped with a rotary table and a radiation adjusting member, which includes a reflective or absorption film to control the amount of radiant heat from a heater unit, allowing for precise adjustment of substrate temperature distribution by reflecting or absorbing thermal radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a heater is provided below the rotary table to heat multiple substrates, then the substrates can be heated by thermal radiation, but the in-plane temperature distribution becomes non-uniform (concentric shape)
Solution Approach 1:
The radiation adjusting member is divided into multiple regions with different radiation transmission characteristics. Specifically, the member has a first region with a first radiation transmission ratio and a second region with a second radiation transmission ratio that is different from the first. This allows different portions of the substrate to receive different amounts of radiant heat, enabling precise control of in-plane temperature distribution across the substrate surface.
Solution Approach 2:
A radiation adjusting member is introduced as an intermediary component between the heater and the substrates. This member selectively transmits or blocks thermal radiation to different regions, acting as a mediator that controls the heat distribution pattern. The member can be configured with various structures (openings, partitions, selective transmission regions) to achieve the desired temperature uniformity.
2Use of energy by moving object
If thermal radiation is used to heat multiple substrates on the rotary table, then heating efficiency is improved, but control over temperature distribution becomes difficult
Solution Approach 1:
The radiation adjusting member implements local quality control by having different radiation transmission ratios in different regions. This allows independent control of heat flux to various substrate positions while maintaining efficient thermal radiation heating. The selective transmission regions enable precise local temperature control without sacrificing overall heating efficiency.
Solution Approach 2:
The system controls temperature distribution by changing the radiation transmission ratio parameter across different regions of the adjusting member. By varying this parameter spatially (creating regions with different transmission ratios), the system achieves both efficient heating and precise temperature distribution control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively adjusts the in-plane temperature distribution of substrates, enabling more uniform heating and improving film quality by controlling temperature differences across the substrate surface.
Implementation Method 1
The heating device is configured to heat the multiple substrates by thermal radiation
Implementation Method 2
A deposition apparatus equipped with a rotary table and a radiation adjusting member, which includes a reflective or absorption film to control the amount of radiant heat from a heater unit, allowing for precise adjustment of substrate temperature distribution by reflecting or absorbing thermal radiation
Implementation Method 3
A deposition apparatus equipped with a rotary table and a radiation adjusting member, which includes a reflective or absorption film to control the amount of radiant heat from a heater unit, allowing for precise adjustment of substrate temperature distribution by reflecting or absorbing thermal radiation
Data Source
AI summary
A deposition apparatus according to one aspect of the present disclosure includes a vacuum vessel, a rotary table rotatably disposed in the vacuum vessel, a heating device provided below the rotary table, and a radiation adjusting member. The rotary table is configured such that multiple substrates can be placed on the rotary table along a circumferential direction of the rotary table. The heating device is configured to heat the multiple substrates by thermal radiation, and the radiation adjusting member is configured to adjust an amount of radiant heat from the heating device to the plurality of substrates.