Rotatable Cathode Unit for Multilayer Film Sputtering

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Solution Overview

Problem

Conventional sputtering apparatuses have short maintenance cycles and limited target area due to small target size, leading to inefficient multilayer film formation with spiral patterns due to rotating magnet units and frequent power supply interruptions.

Innovation Solution

A multilayer-film sputtering apparatus with a rotatable cathode unit having multiple targets arranged on the same circumference, equipped with a sensor for position detection and a power-supply mechanism, allowing continuous film formation without interruptions by distinguishing and controlling the discharge of each cathode based on its position and rotation angle.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If a rotating magnet unit is used in conventional sputtering apparatus, then the target area is limited and small, but the multilayer film formation is achieved

Engineering Contradiction:
Improvetarget areaVSAvoidmultilayer film formation efficiency
Core Design Contradiction:
Area of stationary objectVSProductivity

Solution Approach 1:

The cathode unit is divided into multiple independent cathodes (first cathode and second cathode) arranged side by side, each capable of independent discharge control. This segmentation allows simultaneous or sequential film formation from multiple targets, eliminating the limitation of small target area while maintaining multilayer film formation capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple cathodes are merged into a single cathode unit that rotates together, combining the functionality of multiple targets while sharing a common rotation mechanism. This approach increases the effective target area without requiring multiple separate rotating units, thereby improving productivity.

Inventive Principle:
Principle #5Merging (Combining)

2Productivity

If the cathode unit rotates continuously, then the film formation can proceed, but spiral patterns are formed on the substrate

Engineering Contradiction:
Improvefilm formation continuityVSAvoidfilm uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The discharge of each cathode is controlled periodically based on its rotational position. By detecting the rotation angle and selectively discharging the first or second cathode at appropriate intervals, uniform film thickness is achieved without spiral patterns, while maintaining continuous film formation through alternating cathode activation.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

A rotation detection mechanism provides real-time feedback on the cathode unit's rotational position. This feedback enables the control system to determine when each cathode is in the optimal position for discharge, ensuring uniform film deposition by activating cathodes only when they are correctly oriented relative to the substrate.

Inventive Principle:
Principle #23Feedback

3Adaptability or versatility

If power supply is interrupted frequently for multilayer film formation, then different layers can be deposited, but treatment time increases

Engineering Contradiction:
Improvemultilayer structure controlVSAvoidtreatment time
Core Design Contradiction:
Adaptability or versatilityVSLoss of time

Solution Approach 1:

The rotation of the cathode unit continues continuously without interruption throughout the multilayer film formation process. Power supply to specific cathodes is controlled based on rotational position, but the mechanical rotation itself never stops, eliminating time losses associated with starting and stopping rotation and maintaining continuous useful action.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The cathode unit is pre-configured with multiple cathodes positioned at specific angular intervals. This preliminary arrangement allows the control system to predict when each cathode will be in the optimal discharge position, enabling seamless transitions between layers without interrupting the overall process, thereby reducing treatment time.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves target utilization efficiency and eliminates spiral patterns, enabling high-productivity multilayer film formation with uniform thickness and reduced treatment time.

Implementation Method 1

a sputtering apparatus which has: a cathode unit which can be rotated; a power-supply mechanism for supplying power to the cathode unit; and a rotation detection mechanism for detecting a rotation angle of the cathode unit

Methodology Applied
Scientific EffectSputtering: Sputtering

Implementation Method 2

discharge is generated on both sides of a carrier unit

Methodology Applied
Scientific EffectDischarge: Plasma

Data Source

PatentUS8956515B2Multilayer-film sputtering apparatus and method of forming multilayer film
Publication Date: 2015.02.17 CANON ANELVA CORP
  • US8956515B2 patent drawing
  • US8956515B2 patent drawing
  • US8956515B2 patent drawing

AI summary

Provided is a sputtering apparatus which can form a multilayer film giving high productivity and with less spiral pattern by effective use of targets, and a method of forming multilayer film using the apparatus. An embodiment is a multilayer-film sputtering apparatus comprising: a rotatable cathode unit (30) having cathodes (7a and 7b) arranged on the same circumference with respect to the rotational center, and having a power-supply mechanism for supplying power to each cathode; a sensor (14) for detecting the position of cathode; and a rotation mechanism for rotating the cathode unit (30).