Rotatable Cone Mask for Disk Nanopatterning
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Solution Overview
Problem
Current nanopatterning techniques face challenges in efficiently patterning rotationally symmetric objects, such as patterned media disks, due to limitations in resolution, throughput, and reliability, particularly with mechanical deformation-based methods like nanoimprint lithography, which struggle with template lifetime, throughput rate, and critical dimension control.
Innovation Solution
The use of Near-Field UV photolithography with a rotatable phase-shifting mask or surface plasmon technology, where the mask is in contact or close proximity to the substrate, employing a transparent cone with specific surface relief or nanopatterned polymeric films, and metal layers with nanoholes to achieve high-resolution patterning of disks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional nanoimprint lithography is used to pattern disks, then patterning capability is achieved, but throughput rate is low and template lifetime is limited
Solution Approach 1:
The patent replaces the mechanical contact-based nanoimprint lithography system with an optical projection system. A master template is used to project patterns through optical fields (photons) rather than direct mechanical contact, eliminating wear on the template and enabling high-speed patterning without degrading the master template over time.
Solution Approach 2:
The patent introduces an optical field as an intermediary between the master template and the substrate. Instead of direct mechanical contact, the pattern is transferred through light projection, allowing the master template to remain stationary and undamaged while still achieving high-throughput patterning of multiple substrates.
2Manufacturing precision
If e-beam direct writing is used to create patterns, then high resolution is achieved, but the process is very slow
Solution Approach 1:
The patent creates a master template with the desired pattern at high resolution (achievable with e-beam writing), then uses this master to optically copy and project the pattern onto multiple substrates simultaneously. This single master template can produce thousands of copies, achieving both high resolution and high throughput.
Solution Approach 2:
The patent separates the pattern creation function (done once on the master template with high-resolution e-beam writing) from the pattern transfer function (done rapidly through optical projection to multiple substrates). This segmentation allows each step to be optimized independently for its specific purpose.
3Manufacturing precision
If DUV lithography is used for patterning, then patterning capability is achieved, but equipment cost is too high
Solution Approach 1:
The patent performs the complex high-resolution patterning operation once during master template fabrication, then uses this pre-created master to rapidly pattern multiple substrates through simpler optical projection. This preliminary action eliminates the need for expensive DUV lithography equipment during high-volume production.
4Area of stationary object
If roll-to-roll nanoimprint is implemented, then large area processing is achieved, but reliability and repeatability of imprinted surface are poor
Solution Approach 1:
The patent replaces the mechanical roll-to-roll contact system with an optical projection system that can cover large areas without physical contact. This eliminates the variability and reliability issues associated with mechanical contact, pressure distribution, and alignment that plague roll-to-roll nanoimprint processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables high-resolution, efficient, and reliable nanopatterning of disks with improved throughput and reduced defects, allowing for the creation of sub-100 nm features on large areas, overcoming the limitations of existing methods.
Implementation Method 1
The nanopatterning technique makes use of Near-Field UV photolithography, where the mask used to pattern the substrate is in contact or in very close proximity (in the evanescent field, less than 100 nm) from the substrate
Implementation Method 2
The exterior surface of the transparent cone is nanopatterned or has a polymeric film or metal layer present thereon. The nanopatterning technique may make use of a phase-shifting mask
Implementation Method 3
The nanopatterning technique makes use of Near-Field UV photolithography, where the mask used to pattern the substrate is in contact or in very close proximity (in the evanescent field, less than 100 nm) from the substrate. The Near-Field photolithography may include a phase-shifting mask or surface plasmon technology
Data Source
AI summary
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.