Rotatable Cylinder Plasma Exit Opening for Coating Apparatus

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Plasma-chemical coating processes have short production cycles, especially when operated with other coating apparatuses like magnetron sputter sources, leading to increased unproductive times and the need for frequent cleaning.

Innovation Solution

The plasma exit opening is configured as an elongated narrowing defined by rotatable cylinders, which reduces the backflow of layer gas and facilitates easy cleaning by rotating the cylinder surface into a dedicated cleaning zone, while maintaining a high flow velocity of plasma-activated gases to the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If plasma-chemical coating processes are operated with high deposition rates, then productivity is improved, but self-coating of apparatus walls increases leading to more frequent cleaning requirements

Engineering Contradiction:
Improvedeposition rateVSAvoidcleaning cycle time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The plasma exit opening is extracted and configured as an elongated narrowing defined by rotatable cylinders. This separates the plasma generation zone from the coating zone, allowing the narrowing to act as a barrier that prevents layer gas backflow onto apparatus walls while maintaining high deposition rates on substrates positioned in the coating zone.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The cylinders defining the plasma exit opening are made rotatable. This dynamic element allows the narrowing to be rotated into a cleaning zone for easy maintenance, and enables adjustment of the plasma flow direction to optimize coating uniformity while preventing wall deposition.

Inventive Principle:
Principle #15Dynamics

2Reliability

If the plasma chamber is designed with a triangular cross-sectional profile to increase flow resistance, then ionization effect is improved, but device complexity increases

Engineering Contradiction:
Improveionization effectVSAvoidchamber geometry
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The plasma chamber is segmented into distinct functional zones: a plasma generation chamber with triangular cross-section for high ionization, and a coating chamber with substrate positioning. The plasma exit opening acts as a transitional element connecting these zones, allowing each section to be optimized independently.

Inventive Principle:
Principle #1Segmentation

3Ease of repair

If cleaning zones are provided for the cylinders, then ease of repair is improved, but device complexity increases

Engineering Contradiction:
Improvecleaning accessibilityVSAvoidsystem structure
Core Design Contradiction:
Ease of repairVSDevice complexity

Solution Approach 1:

The cleaning function is merged with the existing cylinder structure by providing cleaning zones directly on the cylinders that define the plasma exit opening. The rotatable cylinders can be positioned to bring any surface area into contact with cleaning devices, integrating maintenance capability into the operational structure without requiring separate maintenance equipment.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration extends the productive time between cleaning cycles by minimizing self-coating on the apparatus walls, reducing deposition on the antenna and plasma chamber, and allowing for efficient mechanical cleaning without shutting down the system.

Implementation Method 1

at least one linear antenna (5, 5') for producing a plasma (1) by means of electromagnetic power

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

maintaining a high flow velocity of plasma-activated gases to the substrate

Methodology Applied
Scientific EffectGas flow: Convection

Implementation Method 3

plasma-assisted modification of a substrate

Methodology Applied
Scientific EffectPlasma-enhanced chemical vapor deposition: Plasma Enhanced Chemical Vapour Deposition

Data Source

PatentUS10186401B2Plasma-chemical coating apparatus
Publication Date: 2019.01.22 W & L COATING SYST
  • US10186401B2 patent drawing

AI summary

In a known plasma-chemical coating apparatus, a plasma chamber is provided within which at least one linear antenna is arranged for producing a plasma by means of electromagnetic power, in which a supply for a carrier gas terminates and which comprises a plasma exit opening in the direction of a treatment chamber for a plasma-assisted modification of a substrate. Starting from this, to achieve cleaning cycles as in coating apparatuses with comparatively slow coating processes, it is suggested according to the invention that the plasma exit opening is configured as an elongated narrowing and defined preferably on both sides by cylinders which extend in parallel with each other and are rotatable about their cylinder axis, and that a cleaning zone is respectively provided for each of the cylinders, into which an area of the outer surface of the respective cylinder which is to be cleaned can be introduced by rotation about the cylinder axis.