Rotatable Semiconductor Processing Stations for Uniform Heating

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Solution Overview

Problem

Existing semiconductor processing systems face challenges with non-uniform processing due to differences in heat and gas flow, leading to inefficiencies and high overhead costs, particularly in batch processing systems where multiple work pieces are processed simultaneously.

Innovation Solution

A semiconductor processing apparatus with multiple rotatable and heated processing stations within a chamber, where at least two stations rotate synchronously, driven by a motor, and equipped with a platform rotation mechanism and sealing members to maintain an airtight environment and facilitate uniform processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple semiconductor work pieces are processed simultaneously in batch processing systems, then productivity is improved, but manufacturing precision deteriorates due to non-uniform heat and gas flow

Engineering Contradiction:

ImprovethroughputVSAvoidprocessing uniformity

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The batch processing system is segmented into multiple independent processing chambers, each containing individual processing stations. This segmentation allows each station to process work pieces independently with uniform conditions, while the overall system maintains high throughput by operating multiple chambers simultaneously.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system transitions from processing multiple work pieces in a single chamber (2D arrangement) to arranging processing stations in three-dimensional space with vertical and horizontal movement capabilities. This dimensional change enables uniform processing conditions while maintaining batch processing efficiency.

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Productivity

If multiple processing stations are placed in the same chamber, then productivity is improved, but device complexity increases due to difficulty in maintaining uniform conditions

Engineering Contradiction:

ImprovethroughputVSAvoidsystem complexity

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The system divides the processing environment into multiple separate chambers, each containing individual processing stations. This segmentation simplifies the control of each station while maintaining overall system productivity through parallel operation of multiple chambers.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The processing stations are designed with dynamic capabilities including vertical movement between chambers and rotational movement within chambers. This dynamic design allows flexible positioning and uniform processing conditions without requiring complex static arrangements.

Inventive Principle:

Principle #15Dynamics

3Manufacturing precision

If a stationary heating pedestal is used with rotating work piece carriers, then manufacturing precision is improved through uniform heating, but device complexity increases due to separation of heating apparatus from carrier

Engineering Contradiction:

Improvetemperature uniformityVSAvoidsystem complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The heating function is merged with the processing stations themselves rather than being separated into a stationary pedestal. Each processing station includes integrated heating capabilities, eliminating the need for complex separation between heating apparatus and work piece carriers.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The system replaces the mechanical rotation of work piece carriers around stationary heating pedestals with a more sophisticated system of vertically movable and rotatable processing stations. This substitution uses coordinated mechanical movement to achieve uniform heating while simplifying the overall system architecture.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus ensures uniform processing of semiconductor work pieces by synchronously rotating and heating multiple stations, maintaining a sealed environment, and utilizing a cooling system to maintain proper operation, thereby improving processing efficiency and reducing costs.

Implementation Method 1

Located within the heating pedestal there is a high frequency heating coil 14 which is operable to impart heat energy to the silicon substrate 11

Methodology Applied

Scientific EffectHigh frequency heating: Electromagnetic Induction

Implementation Method 2

a platform rotation mechanism individually cooperating with each of the heated and rotatable processing stations

Methodology Applied

Scientific EffectRotational motion:

Implementation Method 3

sealing members to maintain an airtight environment

Methodology Applied

Scientific EffectSealing:

Implementation Method 4

utilizing a cooling system to maintain proper operation

Methodology Applied

Scientific EffectCooling: Cooling

Data Source

PatentUS9947562B2Method and apparatus for processing semiconductor work pieces

Publication Date: 2018.04.17 APPLIED MATERIALS INC

AI summary

A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.