Rotatable Sputtering Plates for Continuous Pre-Sputtering
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Solution Overview
Problem
The existing sputtering apparatuses face challenges in maintaining high equipment operation rates due to the need for extensive pre-sputtering with glass sheets, which increases maintenance costs and causes equipment downtime, leading to reduced production efficiency.
Innovation Solution
A sputtering apparatus design featuring a vacuum chamber with a rotatable stage and two plates (first and second plates) that allow for continuous pre-sputtering during backup, minimizing downtime by enabling parallel and perpendicular rotations to efficiently perform pre-sputtering and main sputtering processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a large amount of pre-sputtering glass sheets are inserted for each PM, then the film quality (sheet resistance and particles) is improved, but the maintenance cost increases and equipment downtime increases
Solution Approach 1:
The patent applies preliminary action by performing pre-sputtering on a separate first plate before the main sputtering process. This prepares the target surface in advance, removing oxide layers and ensuring optimal conditions for high-quality film deposition during the main process, thereby maintaining film quality without requiring extensive pre-sputtering glass sheets during production
Solution Approach 2:
The patent segments the sputtering process into two distinct stages: pre-sputtering on a first plate and main sputtering on a second plate. This segmentation allows pre-sputtering to be performed separately and simultaneously with back-up operations, eliminating the need to stop production for pre-sputtering while still achieving desired film quality
2Manufacturing precision
If a large amount of pre-sputtering glass sheets are inserted for each PM, then the film quality (sheet resistance and particles) is improved, but the maintaining cost increases
Solution Approach 1:
By performing pre-sputtering in advance on a dedicated first plate, the patent eliminates the need to use numerous pre-sputtering glass sheets during main production. This preliminary preparation reduces material consumption and maintenance costs while still achieving the required film quality standards
Solution Approach 2:
Segmenting the process into separate pre-sputtering and main sputtering stages allows for more efficient material usage. The pre-sputtering stage uses minimal or no glass sheets since it is performed on a dedicated plate, reducing the quantity of consumable materials required
3Productivity
If the back-up is delayed to minimize equipment idle time, then the equipment operation rate is improved, but the pre-sputtering and back-up processes cannot be performed simultaneously
Solution Approach 1:
The patent divides the equipment into two independent operational units: a first plate for pre-sputtering and a second plate for main sputtering. This segmentation enables both pre-sputtering and back-up operations to occur simultaneously on different plates, eliminating sequential delays and maximizing equipment operation rate
Solution Approach 2:
By enabling simultaneous operation of pre-sputtering and back-up processes on separate plates, the patent ensures continuous useful action throughout the equipment. Neither process needs to wait for the other, maintaining maximum productivity and eliminating idle time between operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances equipment operation rates by reducing downtime and maintenance costs while ensuring desired film quality, allowing for simultaneous pre-sputtering and backup operations without delaying equipment usage.
Implementation Method 1
a target positioned in the vacuum chamber and capable of sputtering material from a surface of the target
Implementation Method 2
a target positioned in the vacuum chamber and capable of sputtering material from a surface of the target
Data Source
AI summary
A sputtering apparatus for depositing a material on a substrate through a sputtering process includes a vacuum chamber, a target positioned in the vacuum chamber and capable of sputtering a material to be deposited, a first plate attached for a substrate to be coupled thereto or decoupled therefrom and installed to be rotated in the vacuum chamber for the substrate to face the target, and a second plate installed to be rotated in the vacuum chamber to face the target.