Rotatable Target Devices for Uniform Sputtering Deposition
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Solution Overview
Problem
Existing sputtering apparatuses face challenges in processing large-area substrates, resulting in increased size, cost, and uneven surface deposition due to the need for numerous target devices and fixed positions, leading to poor operational and image-quality characteristics.
Innovation Solution
A sputtering apparatus with rotatable and shiftable target devices, arranged parallel to each other, which rotate in specific directions to ensure uniform deposition across the substrate, reducing the number of target devices and apparatus size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the number of target devices is increased to process large-area substrates, then the deposition uniformity is improved, but the apparatus size and cost increase
Solution Approach 1:
The target devices are made rotatable around axes perpendicular to the substrate, allowing dynamic adjustment of target orientation. This enables a smaller number of targets to cover larger substrate areas by changing their emission directions, resolving the contradiction between deposition uniformity and apparatus size
Solution Approach 2:
The invention introduces rotational movement in a new dimension (around vertical axes) rather than only linear arrangement. This allows target particles to reach different substrate regions through rotation, achieving better deposition uniformity without proportionally increasing the number of targets or apparatus footprint
2Manufacturing precision
If the gap between adjacent target devices is reduced, then the deposition uniformity is improved, but the apparatus size and target device count increase
Solution Approach 1:
By making targets rotatable, the invention reduces the need for closely spaced fixed targets. The rotational movement allows each target to cover a broader area, enabling larger gaps between targets while maintaining deposition uniformity, thus reducing the number of target devices required
3Device complexity
If target devices are fixed in position, then the structure is simple, but the deposition uniformity deteriorates
Solution Approach 1:
The invention introduces minimal complexity by adding rotational capability to target devices. This dynamic feature allows targets to adjust their orientation and cover different substrate areas, significantly improving deposition uniformity while adding only moderate structural complexity compared to completely fixed targets
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves a more compact and cost-effective sputtering apparatus capable of forming a uniformly deposited layer on large-area substrates, enhancing operational and image-quality characteristics by minimizing the number of target devices and optimizing target particle distribution.
Implementation Method 1
When a predetermined positive voltage is supplied to the susceptor 2 and a predetermined negative voltage is supplied to the target 5, Ar gas is ionized to Ar+ ions to generate plasma. Because more electrons are collected by the magnetic field of the magnet 7, the generated plasma becomes high-density plasma.
Implementation Method 2
A predetermined potential difference occurs between the region of the high-density plasma and the target 5. The Ar+ ions contained in the high-density plasma region are accelerated by the energy of the predetermined potential difference and thus collide against the target 5. These collisions cause the target 5 to emit target particles
Implementation Method 3
The target 5 emits target particles and is fixed on the front surface of the baking plate 6 that faces the susceptor 2. The emitted target particles are deposited on the substrate 1.
Data Source
AI summary
A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable.