Rotating Aperture Patterns in Multi-Beam Charged Particle Columns
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Solution Overview
Problem
Existing charged particle columns exhibit performance variations and suboptimal resolution across different settings, particularly in semiconductor manufacturing processes, necessitating improved performance and throughput for defect detection and inspection.
Innovation Solution
A multi-beam charged particle column with a beam-limiting aperture array featuring multiple aperture patterns and a rotator or mover to switch between these patterns, along with a manipulator array, to optimize beamlets for improved resolution and throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single aperture pattern is used in the charged particle column, then the device structure is simple, but the resolution and performance vary suboptimally across different beam current settings
Solution Approach 1:
The aperture array is segmented into multiple discrete aperture patterns (first aperture pattern, second aperture pattern, etc.), each optimized for specific beam current ranges. The rotator divides the single aperture array into multiple functional segments that can be independently selected based on operating conditions, resolving the contradiction between maintaining simple structure and achieving optimal resolution across varying settings.
Solution Approach 2:
The aperture array is made dynamic through the rotator mechanism, allowing switching between different aperture patterns based on beam current settings. This dynamic adaptability enables the system to optimize resolution for each operating condition without requiring multiple separate aperture arrays, thus improving manufacturing precision while controlling device complexity.
2Productivity
If the aperture array is rotated to switch between different aperture patterns, then the performance and resolution are improved for various beam currents, but the device complexity increases due to the rotator mechanism
Solution Approach 1:
The single aperture array with multiple patterns serves multiple functions by addressing different beam current settings and inspection requirements within one component. The rotator enables this multi-functionality, allowing the system to achieve high throughput for various operating conditions without requiring separate aperture arrays for each setting, thus improving productivity while managing device complexity through consolidation.
3Measurement precision
If multiple aperture patterns are provided for different beam currents, then the resolution across settings is improved, but the manufacturing complexity of the aperture array increases
Solution Approach 1:
Multiple aperture patterns that would traditionally require separate components are merged into a single aperture array structure. The rotator mechanism combines these different patterns into one manufacturable unit, improving measurement precision across different beam currents while simplifying manufacturing by reducing the number of separate parts that need to be fabricated, aligned, and maintained.
Data Source
AI summary
Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.