Rotating Surface Treatment Chamber for Uniform 3D Film Coating

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Solution Overview

Problem

Conventional plasma film-forming devices struggle to uniformly treat the surfaces of small three-dimensional components, failing to form a uniform film on their entire surface.

Innovation Solution

A surface treatment device equipped with a housing unit, surface treatment means, and stirring means to uniformly treat small three-dimensional components by using plasma and sputtering techniques.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If a plasma film-forming device with fixed substrate holders and cathode electrodes is used, then thin films can be formed on large amounts of thin plate-shaped components, but uniform plasma irradiation cannot be achieved on small three-dimensional components

Engineering Contradiction:

Improveamount of componentsVSAvoiduniformity of film formation

Core Design Contradiction:

Quantity of substanceVSManufacturing precision

Solution Approach 1:

The housing unit is made rotatable around the central axis, transforming a static configuration into a dynamic one. This rotation allows the workpiece to be continuously exposed to plasma from different angles, ensuring uniform irradiation on all surfaces including recessed areas of three-dimensional components.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The invention introduces rotational movement around a central axis, adding a temporal dimension to the plasma exposure process. By rotating the housing unit, plasma treatment is applied not just from a single direction but from all radial directions over time, achieving uniform coverage on three-dimensional surfaces.

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Device complexity

If a conventional plasma film-forming device with fixed electrodes is used, then the device structure remains simple, but the surface treatment cannot be uniformly performed on the entire surface of small three-dimensional components

Engineering Contradiction:

Improvedevice structureVSAvoiduniformity of surface treatment

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The rotating housing unit structure serves multiple functions: it holds the workpiece, provides rotational movement for uniform exposure, and maintains the plasma generation environment. This multi-functional design achieves uniform treatment without requiring multiple separate devices or complex electrode arrangements.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device ensures uniform surface treatment on small three-dimensional components by stirring the workpiece during treatment, achieving consistent film formation across the entire surface.

Implementation Method 1

a plasma generation device that generates plasma and irradiates the workpiece with the generated plasma

Methodology Applied

Scientific EffectPlasma: Plasma

Implementation Method 2

a sputtering device that performs sputtering on the workpiece

Methodology Applied

Scientific EffectSputtering: Sputtering

Data Source

PatentUS12522912B2Surface treatment device

Publication Date: 2026.01.13 SHIBAURA MASCH CO LTD

AI summary

A surface treatment device includes a housing unit, a surface treatment element, and a stirring element. The housing unit houses a workpiece. The surface treatment element performs surface treatment on the workpiece housed in the housing unit. The stirring element stirs the workpiece when the surface treatment element performs the surface treatment on the workpiece.