Rotating Circular Plasma Module for Uniform Powder Treatment
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Solution Overview
Problem
Existing plasma processing apparatuses face difficulties in uniformly processing powders due to the challenge of achieving consistent contact time and surface treatment when using plate electrodes, as they are not designed to handle non-plate-like objects effectively.
Innovation Solution
A powder plasma processing apparatus with a circular surface discharge plasma module, featuring a plate-like electrode layer, an insulating layer, and plasma generating electrodes, which rotates to ensure uniform processing and controlled contact time with plasma, using alternating voltage to generate plasma around the electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If plate electrodes are used for plasma processing, then surface treatment can be achieved on plate-like objects, but uniform processing of powder is difficult
Solution Approach 1:
The plasma processing apparatus employs a rotating circular electrode structure that continuously rotates during plasma generation. This dynamic rotation ensures that powder particles are uniformly exposed to plasma from all directions, achieving consistent surface treatment across all powder particles regardless of their shape or orientation.
Solution Approach 2:
The invention uses a circular surface discharge plasma module with curved electrode surfaces arranged in a circular configuration. This spherical/curved geometry allows plasma to be generated uniformly around the entire circumference, enabling all powder particles to receive equal plasma exposure during rotation, thus achieving uniform processing that flat plate electrodes cannot provide.
2Productivity
If powder is processed between plate electrodes, then plasma can be generated, but contact time control and uniform processing are difficult
Solution Approach 1:
The continuous rotation of the circular electrode structure during plasma generation ensures that powder particles are continuously and uniformly exposed to plasma throughout the processing cycle. This continuous action eliminates dead zones or uneven exposure areas, maintaining both high productivity and uniform processing quality across all particles.
Solution Approach 2:
By making the electrode structure dynamic through rotation, the apparatus achieves continuous uniform plasma exposure of all powder particles. The rotation speed can be controlled to optimize contact time, thereby simultaneously achieving high productivity through efficient processing and uniformity through consistent plasma exposure duration for all particles.
3Manufacturing precision
If a circular surface discharge plasma module is used, then uniform processing of powder is achieved, but device complexity increases
Solution Approach 1:
The circular electrode structure is divided into multiple discrete electrode segments arranged around the circumference. Each segment can be independently positioned and connected to the power supply, allowing modular construction and simplifying manufacturing while maintaining the overall circular geometry needed for uniform plasma generation.
Solution Approach 2:
The circular surface discharge plasma module serves multiple functions: it generates plasma uniformly around the entire circumference, rotates to ensure all powder particles are exposed, and can process various types of powder materials. This multi-functionality justifies the increased structural complexity by providing superior processing uniformity and versatility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and uniform surface treatment of powders by controlling the contact time with plasma, overcoming the limitations of prior art in processing non-plate-like objects.
Implementation Method 1
An alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate a plasma around the plasma generating electrode
Implementation Method 2
A dielectric barrier discharge (DBD) technique is employed as the representative dielectric film discharge
Data Source
AI summary
A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the circular surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the circular surface discharge plasma module.