Rotating Thin Film Deposition Apparatus Uniformity
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Solution Overview
Problem
Existing thin film deposition methods using reciprocating motion face challenges in maintaining uniformity due to acceleration and deceleration periods, leading to inefficient deposition and large equipment sizes when multiple targets are used.
Innovation Solution
A rotating type thin film deposition apparatus with a circulation track and support unit that moves the deposition target at a constant speed, utilizing a circulation belt and clamping mechanism to ensure continuous and uniform deposition without acceleration periods, and a guide unit for stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the deposition target is moved relative to the deposition device in a reciprocating manner, then deposition can be performed on multiple targets, but acceleration and deceleration periods are generated making it difficult to maintain uniform deposition
Solution Approach 1:
The patent applies dynamics by transitioning from static reciprocating motion to dynamic continuous rotation. The support unit rotates continuously along a circular track, eliminating the need for acceleration and deceleration phases while maintaining uniform deposition conditions throughout the rotation cycle.
Solution Approach 2:
The patent implements continuity of useful action through continuous rotation of the support unit. Unlike reciprocating motion that requires stopping and starting, the rotational motion maintains constant velocity and continuous deposition exposure, ensuring uniform process conditions throughout the entire deposition cycle.
2Productivity
If multiple deposition targets are arranged in one line and moved simultaneously in a reciprocating manner, then working speed increases, but the size of the deposition device needs to be considerably large
Solution Approach 1:
The patent applies dimensionality change by transitioning from linear reciprocating motion to circular rotational motion. Multiple deposition targets are arranged radially around a circular track, allowing simultaneous processing in a compact footprint. This radial arrangement in two dimensions replaces the linear arrangement that would require extensive space in one dimension.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise and uniform thin layer formation on the entire surface of the deposition target, increases working speed, and reduces the size of the deposition apparatus compared to traditional methods.
Implementation Method 1
a circulation belt coupling the driving pulley to the driven pulley. The circulation belt defines the circulation track, and runs along the circulation track
Implementation Method 2
a clamping mechanism that fixes the deposition target to the support plate
Implementation Method 3
A deposition process whereby vapor generated in a deposition source is deposited on the surface of a deposition target
Data Source
AI summary
A rotating type thin film deposition apparatus having an improved structure that allows continuous deposition, and a thin film deposition method used by the rotating type thin film deposition apparatus are provided. The rotating type thin film deposition apparatus includes a deposition device; a circulation running unit that runs a deposition target on a circulation track via a deposition region of the deposition device; and a support unit that supports the deposition target and moves along the circulation track. Thin layers can be precisely and uniformly formed on the entire surface of a deposition target, and since deposition is performed while a plurality of deposition targets move along a caterpillar track, a working speed is faster compared to a method involving a general reciprocating motion, and the size of the thin film deposition apparatus can be reduced.