Rotating Magnet Sub-Assemblies for Uniform Nitrogen Implantation
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Solution Overview
Problem
Current nitrogen implantation systems using magnetic fields do not achieve uniform material distribution between front and rear disk surfaces and between the first and second disks, leading to non-uniform implantation results.
Innovation Solution
A system with rotating magnet sub-assemblies generating directed magnetic fields that combine to form a resultant magnetic field parallel to the substrate surfaces, combined with RF energy, ensures uniform material implantation on substrates by using a chamber with rotating assemblies and RF energizer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If four ring magnet packs are held stationary in front of each disk surface to produce magnetic field for nitrogen implantation, then the implantation rate increases, but the nitrogen implantation becomes non-uniform between front and rear disk surfaces and between different disks
Solution Approach 1:
The patent applies the dynamics principle by rotating the magnet packs instead of keeping them stationary. The magnet packs are rotated at speeds between 5-500 RPM to create a time-varying magnetic field that averages out the non-uniformities, achieving uniform nitrogen implantation across both disk surfaces while maintaining high implantation rates.
2Quantity of substance
If RF power is applied to carrier holding two disks under magnetic field influence, then plasma density increases, but magnetic field interaction between different magnet packs causes non-uniform implantation
Solution Approach 1:
The rotation of magnet packs creates a dynamic magnetic field environment that prevents localized magnetic field interactions from causing non-uniformity. The continuous rotation ensures that plasma density increases are distributed uniformly across both disk surfaces, eliminating the non-uniform implantation caused by static magnetic field interactions.
3Productivity
If high throughput sputter tool is used for simultaneous implantation on two disks, then productivity increases, but uniformity of implantation between disks deteriorates
Solution Approach 1:
The patent maintains high throughput by simultaneously implanting on two disks while achieving uniformity through the rotation of magnet packs. The dynamic rotation creates equivalent time-averaged magnetic field conditions for both disks, ensuring uniform implantation across all surfaces while processing two disks in parallel.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves uniform nitrogen implantation across both surfaces of substrates, reducing non-uniformity and enhancing the average nitrogen content, as demonstrated by comparisons with conventional systems using fixed ring magnet assemblies.
Implementation Method 1
a first rotating magnet sub-assembly configured to direct a first magnetic field onto the first surface, a second rotating magnet sub-assembly configured to direct a second magnetic field onto the second surface
Implementation Method 2
an radio frequency (RF) energizer configured to apply RF energy to the first substrate, where the implantation of the preselected material onto the first substrate occurs based on a combination of the RF energy and the resultant magnetic field
Data Source
AI summary
Systems and methods for uniformly implanting materials on substrates using directed magnetic fields are provided. One such system includes a chamber configured to receive a preselected material and to enclose a first substrate, first and second rotating assemblies configured to facilitate an implantation of the preselected material onto first and second surfaces of the first substrate and including first and second rotating magnet sub-assemblies configured to direct magnetic fields onto the first and second surfaces, and an RF energizer configured to apply RF energy to the first substrate, where the first magnetic field and the second magnetic field combine to form a resultant magnetic field that is substantially parallel along the first surface, and where the implantation of the preselected material onto the first substrate occurs based on a combination of the RF energy and the resultant magnetic field.