Rotating Plating Fixture for Uniform Deep Cavity Electroforming

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Solution Overview

Problem

Deep cavities in electroforming processes require long plating times, leading to turbulent flow and adverse effects on plating height variation, making it challenging to achieve a level deposit for efficient plating and further processing.

Innovation Solution

A rotating plating fixture with a stepper motor, pinion gear, and bevel gear system that precisely controls the rotation of a substrate within the plating bath, using polyether ether ketone (PEEK) components to ensure chemical inertness and stability, which reduces turbulent flow and promotes uniform plating by changing the substrate's orientation during the plating cycle.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If long plating times are used to fill deep cavities, then the cavity filling is improved, but turbulent flow increases causing plating height variation

Engineering Contradiction:
Improvecavity fillingVSAvoidturbulent flow
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The substrate is rotated during the plating process to dynamically change the orientation of deep cavities relative to the plating bath. This rotation prevents stagnant turbulent flow patterns that cause plating height variation, allowing uniform deposit formation even in deep cavities without requiring excessively long plating times.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The plating process employs periodic rotation of the substrate at controlled intervals. This periodic motion creates consistent flow patterns that prevent turbulent accumulation, enabling uniform plating in deep cavities while maintaining reasonable plating times.

Inventive Principle:
Principle #19Periodic action

2Manufacturing precision

If long plating times are used, then deep cavity filling is improved, but plating time increases

Engineering Contradiction:
Improvecavity fillingVSAvoidplating time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

By dynamically rotating the substrate during plating, the system enhances metal ion distribution into deep cavities without requiring prolonged exposure times. The rotation creates favorable flow conditions that accelerate cavity filling while preventing deposit variation.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes the orientation parameter of the substrate during plating by rotating it to various angles. This parameter change optimizes the exposure of deep cavity surfaces to the plating solution, significantly improving filling efficiency and reducing required plating time.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If the substrate remains stationary, then the plating setup is simple, but plating uniformity deteriorates in deep cavities

Engineering Contradiction:
Improveplating setupVSAvoidplating uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The substrate is rotated during plating to dynamically optimize the exposure of different surfaces to the plating solution. This simple rotational movement significantly improves plating uniformity in deep cavities without requiring complex multi-axis positioning systems.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables efficient and uniform plating in deep cavities by controlling the substrate's rotation, reducing plating time and ensuring consistent deposit thickness, thereby improving the quality of electroformed structures.

Implementation Method 1

In order to fill deep cavities with electroformed structures

Methodology Applied
Scientific EffectElectroplating: Electroplating

Implementation Method 2

A plating system comprises a plating bath holding a plating fluid. The plating system comprises a substrate. The plating system comprises an anode. The plating system comprises a rectifier. The rectifier is electrically coupled to the substrate and the anode.

Methodology Applied
Scientific EffectElectrochemical deposition: Electrodeposition

Implementation Method 3

With the deep cavities, turbulent flow across the part can have an adverse effect on plating height variation

Methodology Applied
Scientific EffectTurbulent flow reduction: Turbulence

Data Source

PatentUS20250019858A1Rotating plating fixture
Publication Date: 2025.01.16 ROCKWELL COLLINS INC
  • US20250019858A1 patent drawing
  • US20250019858A1 patent drawing
  • US20250019858A1 patent drawing

AI summary

A rotating plating fixture changes an orientation of the substrate throughout a plating cycle. The plating fixture changes the orientation by precisely controlling a rotation speed and position of the substrate. A stepper motor changes the orientation in response to control signals from a controller. The plating fixture includes a stepper motor fixed to a hanger, a shaft coupled to the stepper motor, a pinion gear coupled to the shaft such that rotation of the shaft by the stepper motor causes rotation of the pinion gear, and a bevel gear meshing with the pinion gear.