Segmented Rotating Rare Earth Target for Controlled Co-Sputtering
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing methods for sputtering rare earth target materials, such as NdFeB magnet coating, face challenges including low sputtering efficiency and difficulty in controlling sputtering parameters, leading to a low utilization rate of rare earth metals.
Innovation Solution
A co-sputtering rare earth rotating target material is developed, comprising a back tube and multiple sections of target tubes welded concentrically, with rare earth and co-sputtering target tubes arranged along the axial direction. This configuration allows for simultaneous sputtering of rare earth elements and co-sputtering elements like aluminum and copper, improving grain boundary diffusion and magnet performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If single target material step-wised sputtering is used, then the sputtering parameters are easy to control, but the sputtering efficiency is low
Solution Approach 1:
The target material is segmented into multiple independent target sections (first target section, second target section, third target section) along the axial direction, each capable of being sputtered independently or simultaneously. This segmentation allows for improved sputtering efficiency by processing multiple areas concurrently while maintaining parameter control through independent power supply to each section.
Solution Approach 2:
The rotating target structure serves multiple functions: it acts as both the sputtering target and the rotation mechanism, eliminating the need for separate target replacement systems. The target can rotate to present different sections to the sputtering source, enabling both single and multi-section sputtering modes, thus providing operational flexibility and improved efficiency.
2Productivity
If independent target material sputtering at the same time is used, then the sputtering efficiency is improved, but the sputtering parameters are difficult to control
Solution Approach 1:
The target is divided into multiple independently controllable sections, each with its own power supply circuit. This allows simultaneous sputtering of multiple sections while maintaining independent control over sputtering parameters for each section, resolving the contradiction between efficiency and controllability.
Solution Approach 2:
The target rotation mechanism dynamically adjusts which sections are presented to the sputtering source at any given time. By controlling the rotation speed and position, the system can optimize the sputtering process for different material compositions while maintaining parameter control, enabling efficient multi-section sputtering with manageable complexity.
3Device complexity
If planar target material is used, then the structure is simple, but the utilization rate of rare earth metal is low (30-50%)
Solution Approach 1:
The target is designed as a rotating cylindrical structure instead of a static planar target. This curved, rotating geometry allows the sputtering source to access different portions of the target surface during rotation, significantly increasing the effective utilization area of the rare earth metal from 30-50% to potentially 80% or more, while maintaining structural simplicity.
Solution Approach 2:
The rotating target dynamically presents different surface areas to the sputtering source during operation. This dynamic exposure ensures more uniform consumption of the target material and prevents localized depletion, thereby improving overall material utilization efficiency without complicating the basic target structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution enhances sputtering efficiency, reduces grain boundary diffusion time and temperature, and improves the utilization rate of rare earth target materials to up to 85% or more, while optimizing magnet performance.
Implementation Method 1
Magnetron sputtering coating is one of the main ways of grain boundary diffusion of neodymium-iron-boron (NdFeB)
Data Source
AI summary
Disclosed are a co-sputtering rare earth rotating target material, and a preparation method and an application method therefor. The co-sputtering rare earth rotating target material includes two sections of end target tubes arranged at an axial end of the target material, and a plurality of sections of rare earth target tubes and a plurality of sections of co-sputtering target tubes which are arranged between the two sections of end target tubes and with a target material along an axial middle region, wherein the plurality of sections of rare earth target tubes are spaced apart from the plurality of sections of co-sputtering target tubes, and the target tubes are mutually assembled via welding; and the co-sputtering target tubes are selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes.