Rotating Sputter Target Insert for Wear Distribution
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Solution Overview
Problem
Ion beam deposition processes face inefficiencies in target material utilization and lifetime, leading to high costs due to the need for frequent target replacements and uneven wear patterns, which result in significant downtime and material waste.
Innovation Solution
A sputtering target system featuring a central insert surrounded by an outer skirt, where the insert rotates during use to distribute wear evenly across its surface, either continuously or in an indexed manner, allowing for more efficient use of the target material and extending its lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the target is stationary during ion beam deposition, then the process geometry and beam parameters can be optimized for maximum deposition rate, but the wear is concentrated in one area leading to short target lifetime and low material utilization
Solution Approach 1:
The patent applies the dynamics principle by making the target insert rotatable rather than stationary. The insert can rotate during ion beam deposition to distribute wear across its surface, extending target lifetime while maintaining the ability to hold the target steady when needed for optimized deposition processes. This dynamic capability resolves the contradiction between maintaining stationary optimization for productivity and enabling motion for extended lifetime.
Solution Approach 2:
The patent segments the target into a reusable outer skirt and a replaceable inner insert. The insert is the portion that rotates and experiences wear, while the skirt remains stationary and can be reused. This segmentation allows the wear-prone portion to be rotated or replaced independently, extending the overall target lifetime without affecting the reusable outer structure.
2Reliability
If the entire target is replaced when worn, then a fresh target ensures optimal deposition quality, but it causes production line downtime and wastes the unused portions of the expensive target material
Solution Approach 1:
The patent segments the target into a reusable outer skirt and a replaceable inner insert. When the insert becomes worn, only the insert needs to be replaced while the skirt remains in use. This segmentation enables quick replacement of the worn portion without replacing the entire target, reducing production downtime and waste of expensive materials while maintaining deposition quality through timely replacement of the critical insert portion.
Solution Approach 2:
The patent applies discarding and recovering by allowing the outer skirt to be recovered and reused after the inner insert is replaced. The skirt is designed to remain in place and can be used with a new insert, thereby recovering a significant portion of the target material and reducing both downtime and material waste associated with complete target replacement.
3Ease of manufacture
If the target insert is made smaller to reduce material cost, then the cost of new inserts is reduced, but the target lifetime is shortened due to faster wear through the insert thickness
Solution Approach 1:
The patent applies dynamics by enabling the insert to rotate during operation. This rotation distributes the ion beam impact across the entire surface area of the insert rather than concentrating wear at a single spot. Consequently, even smaller inserts can achieve longer effective lifetimes because the wear is spread out, allowing the insert to be rotated to a fresh surface before being replaced. This resolves the contradiction between using smaller, cheaper inserts and maintaining adequate target lifetime.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly increases target utilization and lifetime, reducing the frequency and cost of replacements while maintaining process geometries, with the target insert being replaced more frequently than the entire target, thus minimizing downtime and material waste.
Implementation Method 1
Ion beam deposition processes face inefficiencies in target material utilization and lifetime
Implementation Method 2
a tool using a target with a central insert surrounded by an outer region, incorporates a rotational motion element rotating the target insert
Data Source
AI summary
In a sputter deposition tool (100) of the type in which an ion source (101) generates a beam directed at a sputtering target, the sputtering target comprises an elongated exterior skirt (102) and a generally circular insert (103) positioned within the skirt, the surfaces of the skirt and insert being relatively coplanar and forming the surface of the target, with the elongated dimension of the skirt being axially oriented toward the ion source. The insert is rotated within the skirt to one of several positions during use of the target by the sputter deposition tool, to distribute wear of the target around the rotating insert and thus increase the utilization and useful life of the overall target assembly.