Rotating Substrate Holder Film Formation Apparatus
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Solution Overview
Problem
Existing film formation methods for optical and functional thin films face challenges in achieving improved optical characteristics, wear resistance, water repellency, and anti-fouling properties, as they often result in films with compromised performance due to uniform material supply and irradiation across the entire substrate surface.
Innovation Solution
A film formation method and apparatus that utilize a rotatable substrate holder with a partial supply of film formation material and targeted energetic particle irradiation to specific areas, allowing for a higher material density and energy activation on moving substrates, enhancing bonding forces and film quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If uniform film formation material supply is applied to the entire substrate surface, then the manufacturing process is simple, but the optical characteristics and film quality are compromised
Solution Approach 1:
The patent applies local quality by dividing the substrate surface into multiple regions and supplying film formation material to specific regions rather than uniformly across the entire surface. This targeted approach improves optical characteristics and film quality in critical areas while maintaining process feasibility.
Solution Approach 2:
The substrate surface is segmented into multiple regions, and the film formation process is divided into multiple steps with material supplied to different regions at different times. This segmentation enables precise control over film properties while managing process complexity through systematic regional treatment.
2Strength
If continuous ion irradiation is applied to the entire substrate surface, then wear resistance is improved, but the film formation efficiency decreases
Solution Approach 1:
The patent implements periodic action by alternating between ion irradiation steps and film material supply steps, rather than continuously irradiating the entire surface. This periodic approach maintains wear resistance improvement while enhancing film formation efficiency through optimized timing and regional targeting of irradiation.
Solution Approach 2:
Ion irradiation is applied partially to specific regions rather than excessively to the entire substrate surface. This partial action strategy achieves sufficient wear resistance improvement in critical areas while avoiding the productivity loss associated with full-surface continuous irradiation.
3Force
If high density material supply is applied to moving substrates, then bonding forces are enhanced, but the device complexity increases
Solution Approach 1:
The patent employs dynamics by rotating the substrate holder during film formation, enabling high density material supply to moving substrates. This dynamic approach enhances bonding forces through increased material flux while managing device complexity through the relatively simple mechanical rotation mechanism.
Solution Approach 2:
The rotating substrate holder serves multiple functions: it enables high density material supply, ensures uniform film distribution across different substrate regions, and facilitates efficient use of film formation material. This multi-functionality enhances bonding forces while avoiding excessive device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in thin films with improved optical characteristics, wear resistance, and anti-fouling properties by ensuring stronger bonding and enhanced energy activation, leading to films with better performance and durability.
Implementation Method 1
a film formation means arranged to be able to supply a larger amount of a film formation material of the thin film to a first area that is a partial area of the basal body holding surface than to an area other than the first area
Implementation Method 2
an irradiation means for irradiating energetic particles only toward a second area (A2) that is a partial area of the basal body holding surface
Data Source
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AI summary
Provided is a film formation apparatus with which an anti-fouling film having high usability and antiwear performance may be formed efficiently. According to a film formation apparatus (1) of the present invention, a substrate holder (12) which comprises a basal body holding surface for folding a plurality of substrates (14) is disposed in a vacuum container (10) in a rotatable manner. The film formation apparatus (1) comprises an evaporation source (34) which is disposed in the vacuum container (10) in such a manner that a larger amount of film formation material may be supplied to a first area (A3) that is part of the basal body holding surface than to an area other than the first area (remaining area) when operated toward the substrate holder (12) in a rotation stop state; and an ion source (38) which is disposed in the vacuum container (10) in such a manner, arrangement, and/or direction that energetic particle irradiation may be made toward only a second area (A2) that is part of the basal body holding surface when operated toward the substrate holder (12) in the rotation stop state.