Rotating Substrate Holder for Multi-Position Wet Processing
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Solution Overview
Problem
Conventional single substrate processing type substrate processing apparatuses have limited flexibility in handling various types of processing due to having only one processing position in a chamber.
Innovation Solution
A substrate processing apparatus with a chamber, substrate holding portion, and turning mechanism that allows substrates to be processed at multiple positions using a turning mechanism, enabling multiple processing steps with different liquids, including chemical and rinse liquids, and supporting parallel processing of multiple substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single substrate processing type substrate processing apparatus with one processing position is used, then the apparatus size can be reduced and processing liquid consumption can be minimized, but the flexibility to handle various types of processing is limited
Solution Approach 1:
The substrate holding portion is designed to be rotatable about a turning axis, allowing dynamic repositioning between multiple processing positions. This enables a single apparatus to handle various types of processing by rotating the substrate holder to different positions, each equipped with different processing liquids, thereby improving versatility without significantly increasing overall apparatus complexity
Solution Approach 2:
The substrate holding portion serves multiple functions by being able to hold and rotate substrates to different processing positions. This single component enables multiple processing operations (chemical treatment, rinsing, drying) to be performed on the same substrate within one chamber, providing multi-functionality that resolves the contradiction between versatility and complexity
2Adaptability or versatility
If multiple processing positions are provided in one chamber, then various types of processing can be handled, but the apparatus size and liquid supply complexity increase
Solution Approach 1:
The substrate holding portion rotates continuously or sequentially to move substrates between processing positions without removing them from the chamber. This continuous action enables multiple processing steps (chemical treatment, rinsing, drying) to be performed in sequence on the same substrate, maintaining high productivity while providing versatile processing capabilities
Solution Approach 2:
Instead of providing multiple separate chambers for different processing steps, the invention uses a vertical or rotational dimension by equipping processing positions around a turning axis. This allows multiple processing functions to be accessed by rotating the substrate holder to different angular positions, achieving versatile processing without increasing the linear footprint of the apparatus
Data Source
AI summary
A substrate processing apparatus includes a chamber, a substrate holding portion, and a turning mechanism. The chamber has an opening through which the inside and the outside communicate with each other and a substrate is carried in and out. The substrate holding portion is disposed in the chamber and holds the substrate one by one. The turning mechanism turns the substrate holding portion to move the substrate holding portion between a plurality of processing positions at which the substrate is processed with the processing liquid in the chamber.