Rotating Temperature Regulating Plate for Substrate Processing
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Solution Overview
Problem
Existing substrate temperature regulation technologies face challenges such as limited chemical liquid options and contamination risks due to heater placement and liquid handling issues, particularly with direct discharge methods and stationary heater configurations.
Innovation Solution
A substrate processing apparatus featuring a rotating plate member with a temperature regulating fluid supply system, where the plate member rotates with the substrate, using centrifugal force to prevent contamination and allowing for precise temperature control by moving the plate member between positions close to and away from the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a heater is disposed close to the back surface of the substrate to raise the temperature, then temperature regulation is achieved, but the back surface of the substrate can be contaminated with processing liquid which is bounced or evaporated by the heater
Solution Approach 1:
The heater is extracted from the immediate vicinity of the substrate and replaced with a temperature regulating plate that can be positioned at a distance from the substrate, eliminating the contamination problem while maintaining temperature regulation capability
Solution Approach 2:
A temperature regulating plate is introduced as an intermediary between the heater and the substrate. This plate can be supplied with temperature regulating fluid to control substrate temperature without being in direct contact with processing liquids, thus preventing contamination
2Temperature
If a heated chemical liquid is directly discharged toward the substrate to raise temperature, then temperature regulation is achieved, but usable chemical liquids are limited
Solution Approach 1:
The temperature regulating plate serves as an intermediary that decouples the temperature regulation function from the processing chemicals. This allows any temperature-regulating fluid to be used without limiting the choice of processing chemicals applied to the substrate
Solution Approach 2:
The system is segmented into separate functional zones: the temperature regulation function is separated from the chemical processing function, allowing independent optimization of each and enabling broader material choices for both purposes
3Productivity
If the plate member is positioned close to the substrate for effective temperature regulation, then temperature control efficiency is improved, but the plate member may be contaminated by processing liquid
Solution Approach 1:
The plate member is made movable between different positions relative to the substrate. It can be dynamically positioned close to the substrate for efficient temperature regulation, then moved away to avoid contamination and allow quick temperature adjustment termination
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces contamination on the substrate's back surface while enabling efficient temperature regulation, allowing for quick temperature adjustments and minimizing the use of temperature regulating fluid.
Implementation Method 1
a temperature regulating fluid supply unit which supplies, between the rotation table and the plate member, a temperature regulating fluid for temperature regulation of the plate member
Implementation Method 2
since the plate member also rotates together with the rotation table which rotates the substrate, even if the processing liquid supplied to the rotating substrate is attached to the surface of the plate member, the processing liquid can be moved outwardly by centrifugal force
Data Source
AI summary
A substrate processing apparatus has a base part facing a surface of a rotation table, and the base part is equipped with a plate member which is rotated by a rotation drive unit together with the rotation table while the base member is being disposed between the rotation table and a substrate W held by a plurality of substrate holding members. The substrate processing apparatus is further equipped with: a heating fluid supply unit and a cooling fluid supply unit each of which is provided between the rotation table and the plate member and supplies a temperature regulating fluid for temperature regulation of the plate member; and a controller which controls supply of the temperature regulating fluids from the heating fluid supply unit and the cooling fluid supply unit.


