Rotation Shutter Speed Control for Exposure Accuracy

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Solution Overview

Problem

Existing exposure apparatuses using ultraviolet lamps face challenges in maintaining exposure accuracy and productivity due to the gradual decrease in illuminance over time, leading to deviations in target exposure amounts and requiring frequent maintenance.

Innovation Solution

An exposure apparatus with a control unit that continuously adjusts the rotational speed of the rotation shutter based on real-time illuminance changes, using updated tables or functions to match exposure amounts with target values without stopping the shutter, thereby maintaining accuracy and productivity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the rotation shutter is continuously driven without stopping to reduce exposure processing time, then productivity is improved, but the accuracy of exposure amount deteriorates due to changing illuminance over time

Engineering Contradiction:
Improveexposure processing timeVSAvoidexposure amount accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The control unit continuously monitors the actual exposure amount and compares it with the target exposure amount, then adjusts the rotational speed of the rotation shutter based on the difference. This closed-loop feedback mechanism ensures that exposure accuracy is maintained even as illuminance changes over time, while the shutter continues to operate without stopping to preserve productivity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The rotational speed of the rotation shutter is made dynamically adjustable rather than fixed. The control unit varies the rotational speed in real-time based on the detected illuminance conditions and exposure amount requirements, allowing the system to adapt to changing light output from the ultraviolet lamp while maintaining continuous operation.

Inventive Principle:
Principle #15Dynamics

2Productivity

If the rotational speed of the rotation shutter is increased to shorten exposure time, then productivity is improved, but the control precision of exposure amount deteriorates

Engineering Contradiction:
Improveexposure processing speedVSAvoidexposure amount control precision
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The control unit uses feedback from optical sensors to continuously monitor the actual exposure amount being delivered. Based on this real-time information, the control unit adjusts the rotational speed to maintain precise control over the exposure amount, even when operating at higher speeds for improved productivity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system changes the operational parameters (rotational speed) dynamically based on process requirements. By adjusting the rotational speed parameter in real-time according to feedback from exposure measurements, the system can optimize both processing speed and control precision rather than being constrained by a fixed speed setting.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution ensures accurate exposure amounts are maintained despite changes in ultraviolet lamp illuminance, reducing the need for frequent maintenance and enhancing productivity by continuously adjusting the rotational speed of the rotation shutter.

Implementation Method 1

a rotation shutter 3 including a light-shielding portion which shields light from a light source unit LS and controls incidence of the light onto a substrate

Methodology Applied
Scientific EffectLight shielding: Absorption (EM radiation)

Implementation Method 2

An ultraviolet lamp as a light source for exposure light, however, gradually decreases in illuminance obtained in accordance with the time of use

Methodology Applied
Scientific EffectUltraviolet emission: Luminescence

Data Source

PatentUS9946164B2Exposure apparatus and method of manufacturing article
Publication Date: 2018.04.17 CANON KK
  • US9946164B2 patent drawing
  • US9946164B2 patent drawing
  • US9946164B2 patent drawing

AI summary

The present invention provides an exposure apparatus including a rotation shutter, and a control unit configured to control a rotational speed of the rotation shutter so as to match an exposure amount on a substrate with a target exposure amount in exposure processing for a shot region, based on first information indicating a relationship between a rotational speed of the rotation shutter and an exposure amount on the substrate when rotating the rotation shutter at the rotational speed without stopping rotation of the rotation shutter so as to make a shift from a first state in which the rotation shutter shields a light to a second state in which the rotation shutter passes the light and then back to the first state, wherein the control unit updates the first information based on second information concerning a change in the illuminance of light.