RPC Flow Distribution for Uniform Multi-Station Chamber Cleaning
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Solution Overview
Problem
Current plasma direct-cleaning systems are inefficient in completely cleaning the interior surfaces of multi-station process chambers, leaving residual films and causing damage due to ion bombardment, and are difficult to implement in multi-chamber tools, especially in peripheral and hard-to-reach areas.
Innovation Solution
A remote-plasma clean (RPC) directional-flow device with multiple ramped gas-diversion areas is used to distribute radical species uniformly across multiple processing stations within a multi-station process chamber, ensuring complete cleaning and minimizing recombination and heating of components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If plasma direct-cleaning system is used to clean process chamber surfaces, then cleaning action is provided, but complete cleaning of surfaces is not achieved and residual films remain
Solution Approach 1:
The gas distribution system is segmented into multiple independently controllable gas inlet ports and flow channels, allowing different regions of the process chamber to receive optimized gas flows tailored to their specific cleaning needs, thereby improving overall cleaning completeness while reducing residual films
Solution Approach 2:
The system provides locally optimized cleaning conditions by directing specific gas compositions and flow rates to different areas of the process chamber. Peripheral and hard-to-reach areas receive enhanced gas flow and radical species concentration to achieve complete cleaning without leaving residual films
2Productivity
If plasma direct-cleaning system operates with high ion bombardment, then cleaning action is enhanced, but damage to hardware components occurs
Solution Approach 1:
The plasma generation is segmented into a remote plasma source separated from the process chamber, allowing radical species to be generated in one location and transported to another. This maintains cleaning efficiency through high radical concentration while eliminating direct ion bombardment damage to hardware components
Solution Approach 2:
A remote plasma source acts as an intermediary, generating reactive radical species that are then transported via gas flow to the process chamber. This mediator approach delivers the cleaning action without the harmful ion bombardment, as the radicals are delivered through a controlled gas stream rather than direct plasma contact
3Adaptability or versatility
If plasma direct-cleaning system is implemented in multi-chamber tools, then cleaning coverage is expanded, but system complexity and implementation difficulty increase
Solution Approach 1:
The remote plasma cleaning system is designed as a universal multi-functional unit that can service multiple process chambers or stations through a single remote plasma source. The system can be configured to clean different chambers sequentially or simultaneously, providing multi-station cleaning capability without requiring separate direct plasma sources for each chamber, thereby reducing overall system complexity
Solution Approach 2:
The remote plasma source serves as a shared intermediary that can deliver radical species to multiple process chambers through controlled gas flow paths. This single intermediary unit replaces what would otherwise require multiple independent plasma sources, simplifying the system architecture while maintaining the ability to clean multiple stations
4Quantity of substance
If conventional gas distribution is used in multi-station chamber, then gas flow is provided, but uniform radical species distribution to all processing stations is not achieved
Solution Approach 1:
The gas distribution system is segmented into multiple controlled flow channels with individual flow control for each processing station. This segmentation allows precise regulation of radical species delivery to each station, ensuring uniform distribution while maintaining ease of operation through independent flow management
Solution Approach 2:
The system incorporates flow sensors and control mechanisms that monitor and adjust gas flow to each processing station in real-time. This feedback control ensures uniform radical species distribution across all stations while automatically compensating for variations in demand or flow conditions, simplifying operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The RPC directional-flow device achieves a substantially complete cleaning of process chamber surfaces, reducing residual films and damage, and is effective in multi-station systems by ensuring uniform gas flow and radical species distribution, enhancing cleaning efficacy and reducing hardware damage.
Implementation Method 1
A remote-plasma clean (RPC) directional-flow device includes multiple, ramped gas-diversion areas. Respective ones of the multiple, ramped gas-diversion areas are configured to direct at least a radical species generated by an RPC reactor
Implementation Method 2
Respective ones of the multiple, ramped gas-diversion areas are configured to direct at least the radical species generated by the RPC reactor to a separate one of multiple processing stations within the multi-station process chamber
Data Source
AI summary
Various embodiments include apparatuses, systems, and methods for using a remote-plasma cleaning system with a directional-flow device for concurrently cleaning multiple processing stations in a processing tool used in the semiconductor and allied fields. In one example, an apparatus used to perform a remote-plasma clean (RPC) in a multi-station process chamber is disclosed and includes an RPC directional-flow device that is to be coupled between an RPC reactor and the process chamber. The RPC directional-flow device includes a number of ramped gas-diversion areas to direct at least a radical species generated by the RPC reactor to a separate one of the processing stations. An incoming cleaning-gas diversion hub is to receive the radical species and distribute at least the species substantially-uniformly to each of the of the ramped gas-diversion areas. Other apparatuses, systems, and methods are disclosed.