Rule-Based Target Pattern Retargeting for Lithographic Accuracy
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current rule-based retargeting methods in lithographic projection apparatuses are limited in accuracy and flexibility, failing to achieve desired printing results due to their reliance on pre-OPC layouts and lack of consideration for neighboring features, leading to inconsistencies and errors in pattern reproduction.
Innovation Solution
A method that determines biasing rules based on the geometry and properties of target features within a measurement region, using a combination of rule-based and model-based approaches to generate retargeted patterns, incorporating additional properties like density and applying specific biases to improve pattern accuracy and flexibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If rule-based retargeting methods are used, then the speed and interpretability of pattern processing is maintained, but the accuracy and flexibility of pattern reproduction deteriorates
Solution Approach 1:
The retargeting method is segmented into distinct rule-based components, where different biasing rules are applied to different regions or features based on their specific characteristics. This allows the system to maintain simplicity while achieving high accuracy by treating different pattern elements separately with targeted rules.
Solution Approach 2:
The patent applies local quality by using biasing rules that are specific to local pattern characteristics such as feature size, shape, and neighboring features. Each region receives customized biasing treatment based on its local properties, improving overall pattern reproduction accuracy without requiring a completely complex global model.
2Manufacturing precision
If pre-OPC layouts are used for retargeting, then the processing workflow is simplified, but the accuracy of pattern reproduction deteriorates due to lack of consideration for neighboring features
Solution Approach 1:
The patent applies preliminary action by incorporating considerations of neighboring features and local pattern context into the retargeting process before final pattern generation. The biasing rules are established in advance based on local characteristics, allowing accurate pattern reproduction while maintaining workflow efficiency.
Solution Approach 2:
The patent changes parameters by introducing biasing rules that adjust pattern dimensions based on local characteristics such as feature size, shape, and neighboring features. This allows the system to adapt to different pattern conditions and achieve high accuracy without completely redesigning the workflow.
3Adaptability or versatility
If fixed biasing rules are applied, then the processing speed is maintained, but the flexibility to adapt to different pattern characteristics deteriorates
Solution Approach 1:
The patent applies dynamics by making the biasing rules adaptive rather than completely fixed. The rules can dynamically adjust based on local pattern characteristics such as feature size, shape, and neighboring features, providing flexibility while maintaining processing efficiency through rule-based implementation.
Data Source
AI summary
A method for generating a retargeted pattern for a target pattern to be printed on a substrate. The method includes obtaining (i) the target pattern comprising at least one feature, the at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with features of the target pattern within a measurement region; determining values of the property at a plurality of locations on the at least one feature of the target pattern, each location surrounded by the measurement region; selecting, from the plurality of biasing rules based on the values of the property, a sub-set of biases; and generating the retargeted pattern by applying the selected sub-set of biases to the at least one feature of the target pattern.