Photosensitive Ruthenium Carbene Catalysts for Functional Polymer Patterning
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Solution Overview
Problem
Current photolithographic technologies have limited functional diversity in photoresists, which restricts their application beyond serving as sacrificial masks or molds, and there is a need for new chemically functional materials that can be generated directly via photolithography for advanced applications like MEMS, microfluidics, and biomaterials.
Innovation Solution
Development of photosensitive compositions comprising Fischer-type carbene ruthenium metathesis catalysts admixed with polymerizable materials containing unsaturated organic precursors, which can be activated by light to crosslink or polymerize, enabling the creation of patterned polymer layers and three-dimensional structures with tailored properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional photoresist materials are used, then the photolithography process can proceed with established techniques, but the functional diversity of the photoresist is severely limited and the material serves only as a sacrificial mask or mold
Solution Approach 1:
The patent applies multi-functionality by designing photoresist materials that simultaneously serve as patterning agents and functional structural elements. The photoresist incorporates catalytic sites, chromophores, or other functional groups that enable the material to perform multiple roles including structural support, chemical catalysis, and optical functionality, thereby eliminating the need for separate sacrificial mask and functional material layers.
Solution Approach 2:
The patent employs composite materials by combining photoresist polymers with functional additives such as metal nanoparticles, catalytic complexes, or bioactive molecules within the photoresist matrix. This creates a composite structure where the photoresist provides patterning capability while the embedded functional components provide additional properties like catalysis, sensing, or structural reinforcement.
2Ease of manufacture
If photoresist serves only as sacrificial mask or mold, then the photolithography process is simple and well-established, but new chemically functional materials cannot be generated directly via photolithography
Solution Approach 1:
The patent applies preliminary action by pre-incorporating functional groups, catalytic sites, or reactive moieties into the photoresist material before patterning. This allows the photoresist to undergo chemical transformations directly during or after the photolithography process, generating functional materials in situ without requiring separate fabrication steps.
Solution Approach 2:
The patent implements self-service by designing photoresist materials that automatically perform functionalization after patterning. The photoresist contains self-assembling functional components or latent catalytic activity that is activated by the photolithography process itself, enabling the material to generate its own functional properties without external intervention.
3Adaptability or versatility
If chemically functional photoresist materials are developed, then new applications in MEMS, microfluidics, and biomaterials become enabled, but the photoresist system becomes more complex
Solution Approach 1:
The patent merges multiple functions into a single photoresist material system. By combining patterning functionality with structural, catalytic, optical, or biological functions in one integrated material, the patent reduces the number of separate layers and processing steps needed, thereby managing complexity while expanding application range.
Solution Approach 2:
The patent applies parameter changes by modifying the chemical composition, molecular weight, crosslinking density, or functional group concentration of the photoresist to optimize performance for specific applications. These parameter adjustments allow the same base photoresist system to be tuned for different applications in MEMS, microfluidics, or biomaterials without requiring completely different material systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the generation of patterned polymer layers and three-dimensional structures with enhanced functionalization, suitable for applications in sensors, drug delivery systems, and tissue scaffolds, offering improved mechanical and optical properties.
Implementation Method 1
wherein the ruthenium carbene catalyst can be activated by irradiation by light having at least one wavelength in a range of from 150 800 nm
Implementation Method 2
the ruthenium carbene catalyst can be activated by irradiation by light having at least one wavelength in a range of from 150 800 nm. In other specific embodiments, the metathesis catalyst of the photosensitive composition, upon activation by irradiation of light of at at least one wavelength in a range of from about 150 nm to about 800 nm, can crosslink or polymerize at least one of the unsaturated organic precursors
Data Source
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AI summary
The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.